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Room temperature synthesis of fluorinated graphite intercalation compounds with low fluorine loading of host matrix
Journal of Fluorine Chemistry ( IF 1.7 ) Pub Date : 2020-02-05 , DOI: 10.1016/j.jfluchem.2020.109482
G.N. Chekhova , D.V. Pinakov , Yu.V. Shubin , V.P. Fadeeva , V.D. Tikhova , A.V. Okotrub , L.G. Bulusheva

The interaction of graphite with a gaseous mixture of BrF3 and Br2 at room temperature produced fluorinated graphite intercalation compounds with bromine. By changing the concentration of BrF3 in Br2 from 6.2 to 2.9 % we were able to obtain matrices of fluorinated graphene layers (C2Fx)n with x = 0.76, 0.66, 0.35, 0.25. It was shown that bromine was completely replaced by acetonitrile in the (C2Fx)n with x > 0.6, while two types of guests (CH3CN and Br2) were present between the layers with the lower fluorine loading. The Van der Waals forces hold CH3CN molecules in the (C2Fx)n host. The interaction of Br2 molecules with sp2-carbon regions remained in the C2Fx layers has donor-acceptor type. The models of guest molecules packing in host matrices (C2Fx)n are considered using the data on the stoichiometry and X-ray diffraction analysis.



中文翻译:

室温合成低基质氟含量的氟化石墨插层化合物

石墨与室温下BrF 3和Br 2的气体混合物的相互作用产生了带溴的氟化石墨插层化合物。通过将Br 2中的BrF 3的浓度从6.2%更改为2.9%,我们可以获得具有x  = 0.76、0.66、0.35、0.25的氟化石墨烯层(C 2 F xn的矩阵。结果表明,在(C 2 F xn中x > 0.6的溴被乙腈完全取代,而两种客体(CH 3 CN和Br 2)存在于具有较低氟负载的层之间。范德华力将CH 3 CN分子保持在(C 2 F xn主体中。Br 2分子与保留在C 2 F x层中的sp 2-碳区域的相互作用具有施主-受主类型。利用化学计量和X射线衍射分析的数据,考虑了客体分子堆积在主体基质(C 2 F xn中的模型。

更新日期:2020-02-06
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