A self-terminated electrochemical atomic layer deposition process is developed to fabricate Au monolayer (ML) film layer-by-layer. It is found that the under potential deposited hydrogen (Hupd) provides perfect termination after each ML deposition and the further ML growth can be replicated after a surface activation using a positive potential to remove the Hupd layer. Voltammetric measurements, deposition current analysis, and EQCM show clear characteristics of UPD hydrogen surface termination and the ML deposition. Both XRR and HREED confirm the Au ML film formation. Moreover, the Au ML film appears to be effective for surface enhanced Raman effect of GO on the Au ML film.

中文翻译：

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用于表面增强拉曼效应的氧化石墨烯单层金膜涂层

开发了一种自终止电化学原子层沉积工艺来逐层制造 Au 单层 (ML) 膜。发现低电位沉积氢 (Hupd) 在每次 ML 沉积后提供完美的终止，并且可以在使用正电位去除 Hupd 层的表面活化后复制进一步的 ML 生长。伏安测量、沉积电流分析和 EQCM 显示了 UPD 氢表面终止和 ML 沉积的清晰特征。XRR 和 HREED 都证实了 Au ML 膜的形成。此外，Au ML 薄膜似乎对 GO 对 Au ML 薄膜的表面增强拉曼效应有效。