In this report, we study different device applications which utilizes oxide layers grown by dual ion beam sputtering (DIBS) system. DIBS system is noteworthy since it produces high-quality thin films with reasonably better compositional stoichiometry, small surface roughness and good adhesion to the substrate even for films grown at room temperature. DIBS system parameters affect the oxide and non-oxide layer in a very significant manner and control of these parameters allows for fine-tuning the as-grown thin films specialize for specific applications.

中文翻译：

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双离子束溅射系统的薄膜沉积

在本报告中，我们研究了利用双离子束溅射（DIBS）系统生长的氧化层的不同器件应用。DIBS系统值得关注，因为它可以生产高质量的薄膜，即使在室温下生长的薄膜，其组成化学计量也相当好，表面粗糙度小，并且与基材的粘附性好。DIBS系统参数以非常重要的方式影响氧化层和非氧化层，对这些参数的控制可以微调专门用于特定应用的已生长薄膜。