Electronic Materials Letters ( IF 2.4 ) Pub Date : 2010 , DOI: 10.3365/eml.2010.03.001 Yongkook Park , Jinggang Lu , George Rozgonyi
In this article, segregation and thermal dissociation kinetics of hydrogen at a large-angle general grain boundary in crystalline silicon have been investigated using deuterium, a readily identifiable isotope that duplicates hydrogen chemistry. Segregation or trapping of introduced deuterium (hydrogen) was found to take place at the (110)/(001) Si grain boundary. The segregation coefficient (k) of deuterium (hydrogen) at the grain boundary was determined as k≈24±3 at 100°C. Thermal dissociation of deuterium (hydrogen) from the grain boundary obeyed first-order kinetics with an activation energy of ∼1.62 eV.
中文翻译:
氢在(110)/(001)硅晶界处的偏析和热解离
在本文中,已经研究了使用氘(重现氢化学的一种易于识别的同位素)研究晶体硅中大角度晶界处氢的偏析和热离解动力学。发现在(110)/(001)Si晶界处发生了引入的氘(氢)的分离或捕获。偏析系数(ķ在晶界氘(氢)的)被确定为ķ ≈24±3在100℃下。氘(氢)从晶界的热解离遵循一级动力学,活化能约为1.62 eV。