Here, a simple dipping coating route was applied to synthesize a series of CoMoSx/NiMoSx chalcogel thin film which in situ grown uniformly on the 3D skeleton of Ni foam as electrocatalysts for the hydrogen evolution reaction (HER). We attempt to understand the effect of pH on the kinetics of the HER. As expected, CoMoSx@Ni foam electrocatalyst presents a low overpotential of 118 mV at 10 mA cm−2 and a low Tafel slope of 85 mV dec−1 for HER in alkaline solution and an overpotential of 129 mV at 10 mA cm−2 and a low Tafel slope of 113 mV dec−1 for HER in acidic solution. The long-term performance of CoMoSx-3@Ni foam revealed that there was no obvious decrease in catalytic activity after 5000 cycles in alkaline medium. We are able to synthesize low-cost and pH-universal catalysts for efficient electrocatalytic production of hydrogen. A dipping coating route was applied to synthesize a series of chalcogel films in situ grown on 3D Ni foam skeleton as catalysts for HER. We attempt to understand the effect of pH on the kinetics of HER. CoMoSx as pH-universal catalyst presents a low overpotential and Tafel slope for HER. HER polarization curves in 0.1 M KOH for chalcogel thin film on Ni foam, scan rate is 5 mV/s. And the inset images are TEM and simulative of chalcogel thin film HER polarization curves in 0.1 M KOH for chalcogel thin film on Ni foam, scan rate is 5 mV/s. And the inset images are TEM and simulative of chalcogel thin film

中文翻译：

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Co(Ni)-Mo-Sx 硫凝胶薄膜作为 H2 析出反应的 pH 通用电催化剂

在这里，采用简单的浸涂工艺合成了一系列 CoMoSx/NiMoSx 硫凝胶薄膜，这些薄膜原位均匀生长在泡沫镍的 3D 骨架上，作为析氢反应 (HER) 的电催化剂。我们试图了解 pH 值对 HER 动力学的影响。正如预期的那样，CoMoSx@Ni 泡沫电催化剂在 10 mA cm-2 下呈现 118 mV 的低过电势和碱性溶液中 HER 的 85 mV dec-1 低 Tafel 斜率和在 10 mA cm-2 下的 129 mV 过电势和对于酸性溶液中的 HER，具有 113 mV dec-1 的低 Tafel 斜率。CoMoSx-3@Ni泡沫的长期性能表明，在碱性介质中循环5000次后催化活性没有明显下降。我们能够合成低成本和 pH 值通用的催化剂，用于高效电催化制氢。采用浸涂工艺合成了一系列原位生长在 3D Ni 泡沫骨架上的硫凝胶薄膜作为 HER 的催化剂。我们试图了解 pH 值对 HER 动力学的影响。CoMoSx 作为 pH 通用催化剂对 HER 具有低过电位和 Tafel 斜率。镍泡沫上的硫凝胶薄膜在 0.1 M KOH 中的 HER 极化曲线，扫描速率为 5 mV/s。插图为 TEM 和模拟的 0.1 M KOH 中镍泡沫上的硫凝胶薄膜的硫凝胶薄膜 HER 极化曲线，扫描速率为 5 mV/s。插图是 TEM 和硫凝胶薄膜的模拟图 CoMoSx 作为 pH 通用催化剂对 HER 具有低过电位和 Tafel 斜率。镍泡沫上的硫凝胶薄膜在 0.1 M KOH 中的 HER 极化曲线，扫描速率为 5 mV/s。插图是 TEM 和模拟的 0.1 M KOH 中镍泡沫上的硫凝胶薄膜的硫凝胶薄膜 HER 极化曲线，扫描速率为 5 mV/s。插图是 TEM 和硫凝胶薄膜的模拟图 CoMoSx 作为 pH 通用催化剂对 HER 具有低过电位和 Tafel 斜率。镍泡沫上的硫凝胶薄膜在 0.1 M KOH 中的 HER 极化曲线，扫描速率为 5 mV/s。插图为 TEM 和模拟的 0.1 M KOH 中镍泡沫上的硫凝胶薄膜的硫凝胶薄膜 HER 极化曲线，扫描速率为 5 mV/s。插图是 TEM 和硫凝胶薄膜的模拟图