Chromium oxide (Cr₂O₃) thin films were prepared by the pulsed laser deposition (PLD) technique onto glass substrates using different laser pulse energies (500–900 mJ). The thickness of the prepared films ranged from 177.3 to 372.4 nm. The X-ray diffraction (XRD) study revealed that Cr₂O₃ thin films are amorphous, but they converted to the rhombohedral crystalline structure with space symmetry group after annealing at 300 °C for two hours. Furthermore, the atomic force microscopy (AFM) exhibited the formation of smooth and well-dispersed surfaces. The optical measurements in the wavelength range between 300 and 1100 nm confirmed that the optical energy gap of the prepared films decreased with increasing laser pulse energy, and a transition of the indirect type with a band gap of ≈ 3.90 eV was determined. The effect of the operation temperature on thin films’ sensitivity has been studied with the aim of optimizing the operation temperature as well as the response and recovery time for the prepared Cr₂O₃ thin films.

中文翻译：

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激光能量对氧化铬薄膜的结构，光学和气敏性能的影响

通过脉冲激光沉积（PLD）技术使用不同的激光脉冲能量（500-900 mJ）在玻璃基板上制备氧化铬（Cr ₂ O ₃）薄膜。制备的膜的厚度为177.3至372.4nm。X射线衍射（XRD）研究表明，Cr ₂ O ₃薄膜是无定形的，但在300°C退火2小时后，它们转变为具有空间对称基团的菱面体晶体结构。此外，原子力显微镜（AFM）显示出光滑且分散良好的表面。在300到1100 nm波长范围内的光学测量结果证实，所制备薄膜的光能隙随着激光脉冲能量的增加而减小，并确定了带隙为≈3.90 eV的间接类型的跃迁。研究了操作温度对薄膜灵敏度的影响，旨在优化操作温度以及所制备的Cr ₂ O ₃薄膜的响应和恢复时间。