In this work, it is shown that controllable increases in chemical reactivity of borosilicate glass can be induced through spatially resolved femtosecond laser irradiation at fluence values significantly lower than the damage threshold. The hydrofluoric acid etch rate has been found to be closely correlated to the reduction in optical transmission of the glass at 488 nm, which is, in turn, governed by the production of boron–oxygen hole centers. The combination of laser irradiation below the ablation threshold followed by chemical etching is shown to yield surfaces that have a roughness lower than those achieved by either laser or chemical etching alone. Application of this effect to the manufacture of freeform Laplacian optics is demonstrated.

中文翻译：

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通过空间分辨的激光产生的色心提高硼硅玻璃的化学蚀刻速率

在这项工作中，表明可以通过空间分辨飞秒激光辐照在注量值显着低于损伤阈值的情况下诱导硼硅玻璃化学反应的可控增加。已经发现氢氟酸蚀刻速率与488 nm玻璃的光学透射率的降低密切相关，而后者又受硼-氧空穴中心的产生的影响。低于烧蚀阈值的激光辐照和随后的化学蚀刻的组合显示出具有比单独通过激光或化学蚀刻获得的粗糙度低的粗糙度的表面。演示了这种效应在自由形式拉普拉斯光学器件制造中的应用。