High-quality AB-stacked bilayer or multilayer graphene larger than a centimetre has not been reported. Here, we report the fabrication and use of single-crystal Cu/Ni(111) alloy foils with controllable concentrations of Ni for the growth of large-area, high-quality AB-stacked bilayer and ABA-stacked trilayer graphene films by chemical vapour deposition. The stacking order, coverage and uniformity of the graphene films were evaluated by Raman spectroscopy and transmission electron microscopy including selected area electron diffraction and atomic resolution imaging. Electrical transport (carrier mobility and band-gap tunability) and thermal conductivity (the bilayer graphene has a thermal conductivity value of about 2,300 W m⁻¹ K⁻¹) measurements indicated the superior quality of the films. The tensile loading response of centimetre-scale bilayer graphene films supported by a 260-nm thick polycarbonate film was measured and the average values of the Young’s modulus (478 GPa) and fracture strength (3.31 GPa) were obtained.

尚未报道大于一厘米的高质量 AB 堆叠双层或多层石墨烯。在这里，我们报告了具有可控 Ni 浓度的单晶 Cu/Ni(111) 合金箔的制造和使用，用于通过化学气相生长大面积、高质量的 AB 堆叠双层和 ABA 堆叠三层石墨烯薄膜沉积。通过拉曼光谱和透射电子显微镜（包括选区电子衍射和原子分辨率成像）评估石墨烯薄膜的堆叠顺序、覆盖率和均匀性。电传输（载流子迁移率和带隙可调性）和热导率（双层石墨烯的热导率值约为 2,300 W m ^-1  K ^-1) 测量表明了薄膜的卓越品质。测量了由 260 nm 厚的聚碳酸酯薄膜支撑的厘米级双层石墨烯薄膜的拉伸载荷响应，并获得了杨氏模量 (478 GPa) 和断裂强度 (3.31 GPa) 的平均值。