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Polymer-Assisted Nanoimprinting for Environment- and Phase-Stable Perovskite Nanopatterns.
ACS Nano ( IF 15.8 ) Pub Date : 2020-01-17 , DOI: 10.1021/acsnano.9b06980
Beomjin Jeong 1 , Hyowon Han 1 , Hong Hee Kim 2 , Won Kook Choi 2 , Youn Jung Park 3 , Cheolmin Park 1
Affiliation  

Despite the great interest in inorganic halide perovskites (IHPs) for a variety of photoelectronic applications, environmentally robust nanopatterns of IHPs have hardly been developed mainly owing to the uncontrollable rapid crystallization or temperature and humidity sensitive polymorphs. Herein, we present a facile route for fabricating environment- and phase-stable IHP nanopatterns over large areas. Our method is based on nanoimprinting of a soft and moldable IHP adduct. A small amount of poly(ethylene oxide) was added to an IHP precursor solution to fabricate a spin-coated film that is soft and moldable in an amorphous adduct state. Subsequently, a topographically prepatterned elastomeric mold was used to nanoimprint the film to develop well-defined IHP nanopatterns of CsPbBr3 and CsPbI3 of 200 nm in width over a large area. To ensure environment- and phase-stable black CsPbI3 nanopatterns, a polymer backfilling process was employed on a nanopatterned CsPbI3. The CsPbI3 nanopatterns were overcoated with a thin poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film, followed by thermal melting of PVDF-TrFE, which formed the air-exposed CsPbI3 nanopatterns laterally confined with PVDF-TrFE. Our polymer backfilled CsPbI3 nanopatterns exhibited excellent environmental stability over one year at ambient conditions and for 10 h at 85 °C, allowing the development of arrays of two-terminal, parallel-type photodetectors with nanopatterned photoactive CsPbI3 channels. Our polymer-assisted nanoimprinting offers a fast, low-pressure/temperature patterning method for high-quality nanopatterns on various substrates over a large area, overcoming conventional costly time-consuming lithographic techniques.

中文翻译:

用于环境和相稳定钙钛矿纳米图案的聚合物辅助纳米压印。

尽管对用于各种光电应用的无机卤化物钙钛矿(IHP)表现出极大的兴趣,但由于不可控的快速结晶或对温度和湿度敏感的多晶型物,几乎没有开发出对环境有益的IHP纳米图案。在这里,我们提出了一种在大面积上制造环境和相稳定的IHP纳米图案的简便途径。我们的方法基于柔软可塑的IHP加合物的纳米压印。将少量的聚环氧乙烷添加到IHP前驱物溶液中,以制备旋涂膜,该膜在非晶态加合物状态下柔软且可模塑。随后,使用地形图预先构图的弹性体模具对膜进行纳米压印,从而在大面积上形成宽度为200 nm的CsPbBr3和CsPbI3的清晰定义的IHP纳米图案。为了确保环境和相稳定的黑色CsPbI3纳米图案,在纳米图案化的CsPbI3上采用了聚合物回填工艺。在CsPbI3纳米图案上覆盖一层聚偏二氟乙烯-三氟乙烯共聚物(PVDF-TrFE)薄膜,然后热熔PVDF-TrFE,形成空气暴露的CsPbI3纳米图案,其侧面被PVDF-TrFE限制。我们的聚合物回填CsPbI3纳米图案在环境条件下一年内和在85°C下可保持10 h的优异环境稳定性,从而允许开发具有纳米图案的光敏CsPbI3通道的两端平行型光电探测器阵列。我们的聚合物辅助纳米压印技术提供了一种快速,低压/温度图案化方法,可用于在大面积的各种基材上形成高质量的纳米图案,
更新日期:2020-02-06
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