Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.

中文翻译：

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通过三种不同的物理气相沉积方法对MoNbTaVW HEA薄膜进行角依赖性沉积

在这项工作中，通过直流磁控溅射沉积，高功率脉冲磁控溅射和阴极电弧沉积合成了MoNbTaVW高熵合金薄膜，以研究生长条件对薄膜结构和性能的影响。对于0至90°的沉积角，分析了沉积速率，化学组成，形态和晶体结构以及机械性能。无论沉积角度和方法如何，所有膜均显示出具有体心立方结构的固溶体形成，而较高的能量生长条件有利于改善机械性能。