Abstract Modulation of Si on microstructure and tribomechanical properties of hydrogen-free DLC films was studied by preparing Si-DLC films through a hybrid HiPIMS and middle-frequency magnetron sputtering deposition technique. Atomic force microscope, scanning electron microscope, transmission electron microscope, Raman spectrometer and X-ray photoelectron spectroscopy were used to investigate film chemical composition and microstructure. Hardness and elastic modulus were characterized by a nanoindenter. Friction coefficient was measured by a ball-on-disk tribometer. 3D surface profiler, optical microscope and Raman spectrometer were applied to study the tribological behaviors of Si-DLC films. Films surface roughnesses (Ra) are in the range of 1.18–3.15 nm. Si-DLC layer presents a Si-rich/Si-poor multilayer microstructure with a period of about 4 nm. With the rise of Si content in Si-DLC film, sp3 content, hardness and elastic modulus increase. Most Si atoms are interspersed in the amorphous carbon matrix and bond with carbon atoms forming Si-C bonds. The lowest wear rate of 3.5 × 10-7 mm3/Nm is obtained as Si content in Si-DLC film is 14.8%. Varying Si contents in Si-DLC films generated different bonding states of wear tracks, leading to the different wear behaviors of Si-DLC films.

中文翻译：

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Si对磁控溅射制备的无氢DLC薄膜微观结构和摩擦力学性能的调制

摘要 通过混合 HiPIMS 和中频磁控溅射沉积技术制备 Si-DLC 薄膜，研究了 Si 对无氢 DLC 薄膜微观结构和摩擦力学性能的调制。使用原子力显微镜、扫描电子显微镜、透射电子显微镜、拉曼光谱仪和X射线光电子能谱仪研究薄膜的化学成分和微观结构。硬度和弹性模量由纳米压痕仪表征。摩擦系数通过球盘摩擦计测量。应用3D表面轮廓仪、光学显微镜和拉曼光谱仪研究Si-DLC薄膜的摩擦学行为。薄膜表面粗糙度 (Ra) 在 1.18-3.15 nm 范围内。Si-DLC 层呈现出周期约为 4 nm 的富硅/贫硅多层微结构。随着Si-DLC薄膜中Si含量的增加，sp3含量、硬度和弹性模量增加。大多数 Si 原子散布在无定形碳基体中，并与碳原子结合形成 Si-C 键。当 Si-DLC 薄膜中的 Si 含量为 14.8% 时，获得最低的磨损率 3.5 × 10-7 mm3/Nm。Si-DLC薄膜中不同的Si含量会产生不同的磨痕结合状态，导致Si-DLC薄膜的不同磨损行为。