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Optical properties of Si/SiO2 nano structured films induced by laser plasma ionization deposition
Optics Communications ( IF 1.961 ) Pub Date : 2020-01-16 , DOI: 10.1016/j.optcom.2020.125297
Meisam Moghareh Abed; Franco Gaspari; Amirkianoosh Kiani

This research explores the optical properties of a large group of silicon/silica nanofibrous thin films. A picosecond pulse laser was employed for indirect deposition of ablated silicon on glass substrates. Prominent parameters such as laser power, repetition rate, pulse duration and scanning speed were changed to vary the structural and compositional properties of synthesized nanofibrous thin films. Transmission and specular reflection measurements along with material characterization techniques, Raman and FTIR, were employed for better interpretation of the results. By and large, an increase in the values for repetition rate and scanning speed produced a corresponding increase in optical data intensity, while an increase in power and pulse duration produced a drop in the same data. The results show that degree of oxidation and inherent porous structure are driving the light interaction in thin samples, as indicated by the changes in intensity or spectrum shape. Observation of these trends enabled us to apply tunable fabrication procedures to obtain desired groups of nanofibrous thin films. Electron and optical microscopy as well as background knowledge certify tangled nano-wired morphology in most cases. Structures with highly desirable usages, such as in sensing technology, can be optimized by their porosity, density and thickness.
更新日期:2020-01-16

 

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