Abstract Ni–Ti (Nickel–Titanium) thin alloy films of different concentration and thickness were synthesized using magnetron co-sputtering process utilizing separate Ni and Ti targets. Concentrations of Ni and Ti in the deposited films were optimized by controlling the power ratio of individual Ni and Ti targets. Thickness and density of the layered structures present in the films were evaluated by X-ray Reflectivity (XRR). Atomic concentrations of Ni and Ti were determined by Energy Dispersive X-ray Spectroscopy and matched with the concentrations obtained through XRR measurements. Secondary Ion Mass Spectrometry and Rutherford Backscattering Spectrometry were utilized to investigate the elemental depth distributions of Ni, Ti and O content in the films. Depth distribution studies confirmed that oxygen as a surface contaminant was present in all the deposited films, although films having thickness in the range of 21.5 nm −22.7 nm, were found to contain oxygen within the films too. Thicker Ni–Ti alloy films, in the range of 51.3 nm −52.3 nm, did not reveal any oxygen contamination in the bulk of the films. X-ray Photoelectron Spectroscopy (XPS) was used to determine elemental and molecular content of the deposited films. XPS analysis confirmed the presence of NiO at the surface and intermetallic Ni–Ti within the deposited films.

中文翻译：

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共溅射沉积镍钛合金薄膜的合成及其使用深度敏感技术的成分表征

摘要 使用单独的 Ni 和 Ti 靶材，采用磁控共溅射工艺合成了不同浓度和厚度的 Ni-Ti（镍-钛）合金薄膜。通过控制单个 Ni 和 Ti 靶的功率比，优化了沉积膜中 Ni 和 Ti 的浓度。薄膜中存在的层状结构的厚度和密度通过 X 射线反射率 (XRR) 进行评估。Ni 和 Ti 的原子浓度由能量色散 X 射线光谱法确定，并与通过 XRR 测量获得的浓度相匹配。二次离子质谱法和卢瑟福背散射光谱法被用来研究薄膜中镍、钛和氧含量的元素深度分布。深度分布研究证实，所有沉积膜中都存在作为表面污染物的氧，尽管厚度在 21.5 nm -22.7 nm 范围内的膜也被发现在膜内含有氧。较厚的 Ni-Ti 合金薄膜，在 51.3 nm -52.3 nm 的范围内，在大部分薄膜中没有显示任何氧污染。X 射线光电子能谱 (XPS) 用于确定沉积膜的元素和分子含量。XPS 分析证实了表面存在 NiO，沉积膜中存在金属间化合物 Ni-Ti。X 射线光电子能谱 (XPS) 用于确定沉积膜的元素和分子含量。XPS 分析证实了表面存在 NiO，沉积膜中存在金属间化合物 Ni-Ti。X 射线光电子能谱 (XPS) 用于确定沉积膜的元素和分子含量。XPS 分析证实了表面存在 NiO，沉积膜中存在金属间化合物 Ni-Ti。