In this work polysulfonamide membranes are presented that are prepared by the interfacial polymerization of polyethylenimine (PEI) and benzene-1,3-disulfonyl chloride (BDSC) on porous polyvinylidenefluorid support membrane. The thin film composite (TFC) polysulfonamide membranes show superior acid stability as compared to conventional polysulfonamide membranes that are derived from monomeric amine and benzene-1,3-disulfonyl chloride. The polysulfonamide membranes show exceptionally strong resistance towards nucleophilic attack induced by extreme acidic conditions. This is verified by the dyes rejection performance in 20%(w/v) H₂SO₄ and 2.5%(w/v) HNO₃ aqueous solution at 70 ± 5 °C for 24 h. PEI-PSA and PEI/PIP-PSA membranes were considerably stable in two acids. In contrast, the durability of PEI/MPD-PSA was lower than the other two. The changes in CV and MO dye rejection were −3.15% and −2.19%, and −1.11%, −5.6% for PEI-PSA and PEI/PIP-PSA, respectively after H₂SO₄ soaking while they were −20% and −15.9% for PEI/MPD-PSA. Moreover, the changes in CV and MO dye rejection were −15.7% and −14.3%, and −7.8%, −5.7 % for PEI-PSA and PEI/PIP-PSA, respectively after HNO₃ soaking while they were −17.7% and −10.2% for PEI/MPD-PSA.

在这项工作中，提出了由聚乙烯亚胺（PEI）和苯-1,3-二磺酰氯（BDSC）在多孔聚偏二氟乙烯支撑膜上进行界面聚合制备的聚磺酰胺膜。与衍生自单体胺和苯-1,3-二磺酰氯的常规聚磺酰胺膜相比，薄膜复合（TFC）聚磺酰胺膜显示出优异的酸稳定性。聚磺酰胺膜对极端酸性条件引起的亲核攻击表现出极强的抵抗力。这可以通过在20％（w / v）H ₂ SO ₄和2.5％（w / v）HNO _3中的染料去除性能来验证。水溶液在70±5°C下放置24小时。PEI-PSA和PEI / PIP-PSA膜在两种酸中均相当稳定。相反，PEI / MPD-PSA的耐久性低于其他两种。在H ₂ SO ₄浸泡后，PEI-PSA和PEI / PIP-PSA的CV和MO染料截留率的变化分别为-3.15％和-2.19％，以及-1.11％，-5.6％，而它们分别为-20％和-20％。 PEI / MPD-PSA为-15.9％。此外，在HNO ₃浸泡后，PEI-PSA和PEI / PIP-PSA的CV和MO染料截留率的变化分别为-15.7％和-14.3％，以及-7.8％，- 5.7％，而它们分别为-17.7％和-17.7％。 PEI / MPD-PSA为-10.2％。