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Fabrication of a Plasma Electrolytic Oxidation/Anodic Aluminum Oxide Multi-Layer Film via One-Step Anodizing Aluminum in Ammonium Carbonate
Thin Solid Films ( IF 2.0 ) Pub Date : 2020-03-01 , DOI: 10.1016/j.tsf.2020.137799
Tatsuya Kikuchi , Taiki Taniguchi , Ryosuke O. Suzuki , Shungo Natsui

Abstract A plasma electrolytic oxidation (PEO)/anodic aluminum oxide (AAO) multi-layer film was fabricated via one-step galvanostatic anodizing of high-purity aluminum in 0.3–2.0 M ammonium carbonate ((NH4)2CO3) solutions at 283–333 K and 25–400 Am−2. Anodizing at higher concentrations and higher temperatures caused the formation of relatively uniform anodic oxide film on the aluminum substrate. Characteristic voltage-time curves with two high-plateau voltages at approximately 250 V and 375 V were obtained during galvanostatic anodizing. A multi-layer structure of an outer PEO layer with a crystalline γ-Al2O3 structure and an inner amorphous AAO layer with nano-cylinerical pores was formed by continuous visible sparking occurring after passing the first voltage plateau region. The whole aluminum surface was covered with the multi-layer structure after reaching the second voltage region. The thickness of the multi-layer increased with time via the further anodizing process at the second plateau voltage. Pore sealing of the inner nanoporous film was achieved by immersion post-treatment in boiling water.

中文翻译:

在碳酸铵中一步阳极化铝制备等离子体电解氧化/阳极氧化铝多层膜

摘要 通过高纯铝在 0.3-2.0 M 碳酸铵 ((NH4)2CO3) 溶液中 283-333 的一步恒电流阳极氧化制备等离子体电解氧化 (PEO)/阳极氧化铝 (AAO) 多层膜。 K 和 25–400 Am−2。在较高浓度和较高温度下进行阳极氧化导致在铝基板上形成相对均匀的阳极氧化膜。在恒电流阳极氧化期间获得了具有大约 250 V 和 375 V 的两个高平台电压的特征电压-时间曲线。通过第一个电压平台区域后发生的连续可见火花形成具有结晶γ-Al2O3结构的外部PEO层和具有纳米圆柱孔的内部非晶AAO层的多层结构。到达第二电压区后,整个铝表面被多层结构覆盖。通过在第二平台电压下的进一步阳极氧化过程,多层的厚度随时间增加。通过在沸水中浸泡后处理实现内部纳米多孔膜的孔密封。
更新日期:2020-03-01
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