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Structure and mechanical properties of architecturally designed Ti-Al-N and Ti-Al-Ta-N-based multilayers
Surface & Coatings Technology ( IF 5.3 ) Pub Date : 2020-01-09 , DOI: 10.1016/j.surfcoat.2020.125355
C.M. Koller , S.A. Glatz , H. Riedl , S. Kolozsvári , P. Polcik , H. Bolvardi , P.H. Mayrhofer

Four Ti-Al-N/Ta-Al-N multilayer coatings were developed by a hybrid process combining arc evaporated Ti0.55Al0.45N and sputtered Ta0.57Al0.43N or Ta0.77Al0.23N layers. The two Ti0.55Al0.45N/Ta0.57Al0.43N multilayers have a bilayer period (Λ) of 41 and 25 nm, and the two Ti0.55Al0.45N/Ta0.77Al0.23N multilayers have Λ = 42 and 26 nm, respectively. These are compared with Ti0.51Al0.43Ta0.06N/Ta0.77Al0.23N multilayers having Λ ~40, 33, 25, and 13 nm and are composed of arc evaporated Ti0.51Al0.43Ta0.06N and sputtered Ta0.77Al0.23N layers. The smallest bilayer period of ~13 nm was realised without mechanical shutters, simply by using the two-fold substrate rotation and target arrangement.

The alternating growth of Ta0.57Al0.43N respectively Ta0.77Al0.23N layers with arc evaporated Ti0.55Al0.45N or Ti0.51Al0.43Ta0.06N layers allows for full crystallisation in a single-phase face-centred cubic structure, although monolithically grown, these exhibit additional ε-TaN and/or wurtzite AlN-type phases.

The mechanical properties of our eight different multilayers indicate a dependence on their bilayer period. Highest hardness (33.6 ± 1.1 GPa) combined with a low indentation modulus (375 ± 9 GPa) could be realised by Ti0.51Al0.43Ta0.06N/Ta0.77Al0.23N coatings with Λ = 13 nm, whereas the Ti0.55Al0.45N/Ta0.77Al0.23N multilayer with Λ = 42 exhibits the lowest hardness (31.1 ± 2.1 GPa) combined with a high indentation modulus (392 ± 25 GPa).



中文翻译:

建筑设计的Ti-Al-N和Ti-Al-Ta-N基多层膜的结构和力学性能

通过结合电弧蒸发的Ti 0.55 Al 0.45 N和溅射的Ta 0.57 Al 0.43 N或Ta 0.77 Al 0.23 N层的混合工艺开发了四种Ti-Al-N / Ta-Al-N多层涂层。两个Ti 0.55 Al 0.45 N / Ta 0.57 Al 0.43 N多层膜的双层周期(Λ)为41和25 nm,两个Ti 0.55 Al 0.45 N / Ta 0.77 Al 0.23 N多层膜的Λ= 42和26 nm,分别。将它们与Ti 0.51 Al 0.43 Ta 0.06 N / Ta进行比较具有Λ〜40、33、25和13 nm的0.77 Al 0.23 N多层膜,由电弧蒸发的Ti 0.51 Al 0.43 Ta 0.06 N和溅射的Ta 0.77 Al 0.23 N层组成。只需使用两倍的基板旋转和目标排列,即可在没有机械快门的情况下实现约13 nm的最小双层周期。

Ta 0.57 Al 0.43 N和Ta 0.77 Al 0.23 N层与电弧蒸发的Ti 0.55 Al 0.45 N或Ti 0.51 Al 0.43 Ta 0.06 N层的交替生长允许单晶面心立方结构的完全结晶在生长时,它们表现出额外的ε-TaN和/或纤锌矿AlN型相。

我们的八个不同多层的机械性能表明它们取决于双层周期。Ti 0.51 Al 0.43 Ta 0.06 N / Ta 0.77 Al 0.23 N涂层(Λ= 13 nm )可实现最高的硬度(33.6±1.1 GPa)和低的压痕模量(375±9 GPa),而Ti 0.55 Al 0.45 Λ= 42的N / Ta 0.77 Al 0.23 N多层膜表现出最低的硬度(31.1±2.1 GPa)和高的压痕模量(392±25 GPa)。

更新日期:2020-01-09
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