The cross-sectional distribution and focusing properties of intense pulsed ion beam by an active magnetically insulated diode for material modification is presented. The ion beam accelerator BIPPAB-450 uses the surface flashover of polymers as the ion source, generates intense pulsed ion beam composed of protons and carbon ions with a pulse length of 120 ns, ion energy up to 450 keV, energy density up to 3 J/cm². By the strong flash thermal effects on the surface of materials, the ion beam can be used for the surface treatment and ablation related application. The cross-sectional distribution of the ion beam was measured by infrared imaging method. The results on the focusing of the diode reveal the distribution in the plasma generation on the anode surface. Comparative study on beam focusing during transportation was made and it is demonstrated that by using a copper beam limiter, the maximum beam energy density can be increased by a factor of nearly 1.5. The change in the beam phase-space distribution by the limiter is also exhibited and the influence on beam diagnostics and optimization is discussed reasonably.

提出了用于材​​料改性的有源磁绝缘二极管的强脉冲离子束的截面分布和聚焦特性。离子束加速器BIPPAB-450使用聚合物的表面闪络作为离子源，产生由质子和碳离子组成的强脉冲离子束，脉冲长度为120 ns，离子能量高达450 keV，能量密度高达3 J /厘米²。通过在材料表面上的强烈闪光热效应，离子束可用于表面处理和烧蚀相关的应用。离子束的截面分布通过红外成像法测量。二极管聚焦的结果揭示了阳极表面等离子体产生中的分布。对运输过程中光束聚焦进行了比较研究，结果表明，通过使用铜束限制器，最大光束能量密度可以提高近1.5倍。还展示了限制器对光束相空间分布的变化，并合理地讨论了对光束诊断和优化的影响。