Abstract Photolithography has been used to fabricate various micropatterns; however, recent efforts have focused on the scaling-down process to reduce the feature sizes of the desired patterns and not redefining existing micropatterns. Here, we describe single-mask photolithography method for the shape modulation of designed patterns with a single-mask that utilizes the intrinsic properties of a monolithic photoresist. Our novel approach can achieve various micropatterns with different open areas by adjusting a few fabrication parameters. To create the modulated micropatterns, the material and physical parameters (e.g., soft-bake temperature and exposure dose) were altered and successfully produced modulated shapes. This approach can produce well-controlled micropatterns with desired shapes over a large area with high throughput. Furthermore, our new approach enables access to numerous varieties of micropatterns and can be expandable to two dimensional (2D) and thre dimensional (3D) multiscale architectures.

中文翻译：

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用于微图案形状调制的单光掩模光刻

摘要 光刻已被用于制造各种微图案；然而，最近的努力集中在缩小工艺上，以减少所需图案的特征尺寸，而不是重新定义现有的微图案。在这里，我们描述了利用单片光刻胶固有特性的单掩模对设计图案进行形状调制的单掩模光刻方法。我们的新方法可以通过调整一些制造参数来实现具有不同开放区域的各种微图案。为了创建调制微图案，改变了材料和物理参数（例如软烤温度和暴露剂量）并成功地生成了调制形状。这种方法可以在大面积上以高吞吐量生产具有所需形状的良好控制的微图案。此外，