Abstract We report a magnetostrictive friction phenomenon in atomic force microscopy (AFM) silicon probe sliding against graphene sheets embedded carbon (GSEC) film under external magnetic field. A special electromagnet device was designed on AFM to generate controllable magnetic field for the magnetostrictive friction measurements. GSEC films possessing self-magnetism were prepared by electron irradiation in electron cyclotron resonance (ECR) plasma. The magnetostrictive friction was investigated by adjusting the external magnetic field intensity and self-magnetism of the film. The results showed that the presence of the magnetic field resulted in an evident increment of the friction force of GSEC films with different magnetism, while the friction of nonmagnetic silicon wafer was not affected, indicating that the interaction between external magnetic field and the self-magnetism of the carbon film contributes to the friction increment, i.e. magnetostrictive friction. The mechanism of the magnetostrictive friction was ascribed to the atomic scale real contact area increment induced by the magnetostrictive strain of the graphene sheets. This finding may shed light on the new applications of magnetostrictive friction of carbon film.

中文翻译：

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石墨烯片嵌入碳膜的磁致伸缩摩擦

摘要 我们报告了原子力显微镜 (AFM) 硅探针在外部磁场下与石墨烯片嵌入碳 (GSEC) 膜滑动时的磁致伸缩摩擦现象。在 AFM 上设计了一种特殊的电磁装置，为磁致伸缩摩擦测量产生可控磁场。通过电子回旋共振 (ECR) 等离子体中的电子辐照制备具有自磁性的 GSEC 薄膜。通过调节薄膜的外磁场强度和自磁来研究磁致伸缩摩擦。结果表明，磁场的存在导致不同磁性的GSEC薄膜的摩擦力明显增加，而非磁性硅片的摩擦力不受影响，表明外部磁场与碳膜自磁性的相互作用有助于摩擦增量，即磁致伸缩摩擦。磁致伸缩摩擦的机制归因于由石墨烯片的磁致伸缩应变引起的原子级真实接触面积增量。这一发现可能为碳膜磁致伸缩摩擦的新应用提供启示。