当前位置: X-MOL 学术Ultramicroscopy › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Plan-view Sample Preparation of a Buried Nanodots Array by FIB with Accurate EDS Positioning in Thickness Direction
Ultramicroscopy ( IF 2.1 ) Pub Date : 2019-12-01 , DOI: 10.1016/j.ultramic.2019.112840
Chaorong Zhong 1 , Lina Lin 2 , Ruijuan Qi 2 , Yan Cheng 2 , Xingsen Gao 3 , Rong Huang 4
Affiliation  

Recently, there are growing demands on focus ion beam (FIB) sample preparation technique in plan-view geometry because it can provide the in-plane microstructure information of thin film and allows direct correlations of the atomic structure via transmission electron microscopy with micrometer-scale property measurements. However, one main technical difficulty is to position the buried thin film accurately in a sandwich structure. In this paper, an on-line positioning method based on the thickness monitoring by EDS is introduced, where the intensities of the characteristic X-ray peaks from different layers are proportional to the relative thickness of them at the same acquisition conditions. A high density array of ∼100 nm squares BiFeO3 nanodots with ∼ 25 nm thickness grown on a 20 nm thick SrRuO3 bottom electrode and (001)-oriented SrTiO3 substrate is selected for demonstration. By monitoring the intensities of Pt-M, Sr-L, Ti-K, Ru-L, Fe-K and Bi-M peaks, the relative thickness of Pt protection layer, the BiFeO3, SrRuO3 and SrTiO3 can be obtained, which provide accurate position of the BFO nanodots array in the thickness direction. With these information, the cutting parameters are optimized and a high quality plan-view specimen of BFO nanodots array is prepared, which is confirmed by high resolution transmission electron microscopy. This positioning method should have a wide application for material science.

中文翻译:

通过 FIB 制备埋入纳米点阵列的平面图样品,在厚度方向上具有准确的 EDS 定位

最近,对平面视图几何中的聚焦离子束 (FIB) 样品制备技术的需求不断增长,因为它可以提供薄膜的面内微观结构信息,并允许通过微米级的透射电子显微镜直接关联原子结构属性测量。然而,一个主要的技术难点是在夹层结构中准确定位埋入式薄膜。本文介绍了一种基于EDS厚度监测的在线定位方法,在相同的采集条件下,不同层的特征X射线峰的强度与它们的相对厚度成正比。选择在 20 nm 厚的 SrRuO3 底部电极和 (001) 取向的 SrTiO3 衬底上生长约 25 nm 厚的约 100 nm 方形 BiFeO3 纳米点的高密度阵列进行演示。通过监测 Pt-M、Sr-L、Ti-K、Ru-L、Fe-K 和 Bi-M 峰的强度,可以获得 Pt 保护层、BiFeO3、SrRuO3 和 SrTiO3 的相对厚度,从而提供BFO 纳米点阵列在厚度方向上的准确位置。利用这些信息,优化了切割参数并制备了高质量的 BFO 纳米点阵列平面图样本,并通过高分辨率透射电子显微镜进行了证实。这种定位方法应该在材料科学中有广泛的应用。Pt 保护层的相对厚度,可以得到 BiFeO3、SrRuO3 和 SrTiO3,这提供了 BFO 纳米点阵列在厚度方向上的准确位置。利用这些信息,优化了切割参数并制备了高质量的 BFO 纳米点阵列平面图样本,并通过高分辨率透射电子显微镜进行了证实。这种定位方法应该在材料科学中有广泛的应用。Pt 保护层的相对厚度,可以得到 BiFeO3、SrRuO3 和 SrTiO3,这提供了 BFO 纳米点阵列在厚度方向上的准确位置。利用这些信息,优化了切割参数并制备了高质量的 BFO 纳米点阵列平面图样本,并通过高分辨率透射电子显微镜进行了证实。这种定位方法应该在材料科学中有广泛的应用。
更新日期:2019-12-01
down
wechat
bug