当前位置: X-MOL 学术Adv. Colloid Interface Sci. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Measurements of contact potential difference (work functions) of metals and semiconductors surface by the static ionized capacitor method.
Advances in Colloid and Interface Science ( IF 15.6 ) Pub Date : 2003-09-13 , DOI: 10.1016/s0001-8686(03)00051-4
Sergey Nikolaevich Novikov 1 , Sergey Petrovich Timoshenkov
Affiliation  

Electron work functions of several metals (Au, W, Ag, Cu, Mo, Ti, Al) and Si at atmospheric conditions have been measured by the method of the static capacitor with an ionized gap between the electrodes. Results for all samples, excluding Au, Al and Si, conform to reference data with an accuracy of +/- 1.0%. For samples Au, Al and Si, the electron work function values conform to reference data after short-time heat treatment at atmospheric conditions at 200 degrees C (for Al) and 600 degrees C (for Au, Si).

中文翻译:

用静电离子电容器法测量金属和半导体表面的接触电势差(功函数)。

几种金属(Au,W,Ag,Cu,Mo,Ti,Al)和Si在大气条件下的电子功函数已通过静电电容器的方法进行了测量,电极之间具有电离间隙。除Au,Al和Si外,所有样品的结果均符合参考数据,准确度为+/- 1.0%。对于样品Au,Al和Si,在200℃(对于Al)和600℃(对于Au,Si)的大气条件下进行短时间热处理后,电子功函数值符合参考数据。
更新日期:2019-11-01
down
wechat
bug