We report on a simple and effective process that allows fabricating polymeric dual-scale nanoimprinting molds. The key for the process is the use of a thin flexible SU-8 stencil membrane, which was fabricated by either photolithography or thermal nanoimprint lithography (NIL). The stencil membrane with microscale pores was assembled into a nanopatterned substrate, producing a dual-scale structure. The assembled structure was used as a template to produce polymeric imprinting molds via UV-NIL. With this method, we demonstrated dual-scale nanoimprint molds having nano-pillars of 251 nm diameter and 146 nm high on top of microscale square protrusions of 5 μm wide and 3.6 μm high. The resin mold with the dual-scale structure was successfully used to produce a freestanding membrane with dual-scale perforated pores via UV-NIL. After metal coating and integrated into microfluidic devices, this freestanding membrane can potentially be used as a substrate for surface plasmon resonance sensors.

中文翻译：

---

使用聚合物模板膜制造聚合物双尺度纳米压印模具

我们报告了一种简单有效的工艺，该工艺允许制造聚合物双尺度纳米压印模具。该工艺的关键是使用薄的柔性 SU-8 模板膜，该膜是通过光刻或热纳米压印光刻 (NIL) 制造的。具有微孔的模板膜被组装成纳米图案的基底，产生双尺度结构。组装的结构用作模板，通过 UV-NIL 生产聚合物压印模具。使用这种方法，我们展示了双尺度纳米压印模具，在 5 μm 宽和 3.6 μm 高的微型方形突起顶部具有直径 251 nm 和 146 nm 高的纳米柱。具有双尺度结构的树脂模具通过UV-NIL成功地用于生产具有双尺度穿孔的独立膜。