Analysis of the surface of thin Irganox 1010 films before and after sputtering with an argon gas-cluster ion beam was performed with AFM and XPS to determine the effect that Zalar rotation has on the chemistry and morphology of the surface. The analysis is based on the change in roughness of the surface by comparing the same location on the surface before and after sputtering. The ion beam used was an Arn+ of size n = 1000 and energy 4 keV. The XPS analysis agreed with previous results in which the ion beam did not cause measurable accumulation of damaged material. Based on the AFM results, the Irganox 1010 surface became rougher as a result of ion sputtering, and the degree of roughening was quantified, as was the sputter rate. Furthermore, Zalar rotation during ion sputtering did not have a significant effect on surface roughening, surprisingly.

中文翻译：

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气体团簇离子溅射：对有机层形貌的影响


使用 AFM 和 XPS 对氩气团簇离子束溅射前后的 Irganox 1010 薄膜表面进行分析，以确定扎拉尔旋转对表面化学和形态的影响。该分析基于通过比较溅射前后表面相同位置的表面粗糙度的变化。使用的离子束是 Arn+，尺寸为 n = 1000，能量为 4 keV。 XPS 分析与之前的结果一致，即离子束没有引起可测量的损坏材料的积累。根据 AFM 结果，Irganox 1010 表面由于离子溅射而变得更加粗糙，并且对粗糙程度进行了量化，溅射速率也是如此。此外，令人惊讶的是，离子溅射过程中的扎拉尔旋转对表面粗糙化没有显着影响。