Shadow mask technology has been used over the years for resistless patterning and to pattern on unconventional surfaces, fragile substrate, and biomaterial. In this paper, we are presenting a novel method to fabricate high aspect ratio (15:1) 3-D nickel (Ni) shadow mask with vertical pattern length and width of 1.2 mm and $40~\mu \text{m}$ , respectively. The Ni shadow mask is 1.5 mm tall and $100~\mu \text{m}$ wide at the base. The aspect ratio of the shadow mask is 15. Ni shadow mask is mechanically robust and, hence, easy to handle. It is also reusable and used to pattern the sidewalls of unconventional and complex 3-D geometries, such as microneedles or neural electrodes (such as the Utah array). The standard Utah array has 100 active sites at the tip of the shaft. Using the proposed high aspect ratio Ni shadow mask, the Utah array can accommodate 300 active sites, 200 of which will be along and around the shaft. The robust Ni shadow mask is fabricated using laser patterning and electroplating techniques. The use of Ni 3-D shadow mask will lower the fabrication cost, complexity, and time for patterning out-of-plane structures. [2016-0199]

中文翻译：

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可重复使用的高纵横比 3-D 镍荫罩

多年来，荫罩技术已被用于无阻图案化和在非常规表面、易碎基材和生物材料上进行图案化。在本文中，我们提出了一种制造垂直图案长度和宽度为 1.2 mm 的高纵横比 (15:1) 3-D 镍 (Ni) 荫罩的新方法。 $40~\mu \text{m}$ ， 分别。Ni 荫罩高 1.5 毫米， $100~\mu \text{m}$ 宽在基地。荫罩的纵横比为 15。镍荫罩在机械上很坚固，因此易于处理。它还可以重复使用，用于对非常规和复杂的 3-D 几何结构的侧壁进行图案化，例如微针或神经电极（例如犹他州阵列）。标准的犹他阵列在轴的尖端有 100 个活动位点。使用提议的高纵横比镍荫罩，犹他州阵列可以容纳 300 个活动位点，其中 200 个将沿着和围绕轴。坚固的镍荫罩是使用激光图案化和电镀技术制造的。Ni 3-D 阴影掩模的使用将降低用于构图平面外结构的制造成本、复杂性和时间。[2016-0199]