BACKGROUND Because line width has been close to atom size, for semiconductor industry, except for achieving the target of line width, the cost will be more important. The mask-less laser interference lithography (LIL) technique lowers the cost makes it standing out in the market of lithographic equipment of the excessive cost in the semiconductor industry. METHOD The Keywords of patent retrieval with the theme of LIL are based on the technical features of both the conditions of producing interference lithography and different types of experimental configuration of LIL. Method of patent retrieval include Boolean logic operators are used to express the relationship between sets. Furthermore, it's necessary to find whether common patent classification codes exist in the highly correlated patents and confirm the definition of that. RESULTS The patent review in this research show the patents of LIL technique are classified according to optical method and lithographic equipment. The patents related to optical method of LIL technique take beam splitter based configuration as the main stream; in the technique of lithographic equipment, the patents of system planning technique are the most. CONCLUSION The findings of this review confirm the importance of improving the precision of LIL technique for avoiding the defocus of high-density line width. Besides, it's particularly suitable for the micro nanofluid device in the emerging bionanotechnology to observe fluid behavior at the minimum scale. It doesn't need mask and can produce periodic pattern with nanoscale make it devote to the field of periodicity.

中文翻译：

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用于生产周期性纳米结构的激光干涉光刻技术的专利审查。

背景技术因为线宽已经接近原子尺寸，所以对于半导体工业而言，除了达到线宽的目标之外，成本将更加重要。无掩模激光干涉光刻（LIL）技术降低了成本，使其在半导体行业中成本过高的光刻设备市场中脱颖而出。方法以LIL为主题的专利检索关键词是基于产生干涉光刻的条件和LIL的不同类型实验配置的技术特征。专利检索方法包括布尔逻辑运算符，用于表示集合之间的关系。此外，有必要找出高度相关的专利中是否存在通用的专利分类代码，并确认其定义。结果本研究的专利审查表明，LIL技术的专利根据光学方法和光刻设备进行了分类。与LIL技术的光学方法有关的专利以基于分束器的配置为主流。在光刻设备技术中，系统计划技术的专利最多。结论这篇综述的结果证实了提高LIL技术的精度对于避免高密度线宽散焦的重要性。此外，它特别适合新兴的生物纳米技术中的微纳米流体装置，以最小规模观察流体行为。它不需要掩膜，并且可以产生具有纳米级的周期性图案，使其致力于周期性领域。