We studied silicon, carbon, and SiC x nanostructures fabricated using liquid-phase electron-beam-induced deposition technology in transmission electron microscopy systems. Nanodots obtained from fixed electron beam irradiation followed a universal size versus beam dose trend, with precursor concentrations from pure SiCl4 to 0 % SiCl4 in CH2Cl2, and electron beam intensity ranges of two orders of magnitude, showing good controllability of the deposition. Secondary electrons contributed to the determination of the lateral sizes of the nanostructures, while the primary beam appeared to have an effect in reducing the vertical growth rate. These results can be used to generate donut-shaped nanostructures. Using a scanning electron beam, line structures with both branched and unbranched morphologies were also obtained. The liquid-phase electron-beam-induced deposition technology is shown to be an effective tool for advanced nanostructured material generation.

中文翻译：

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使用原位液体细胞TEM技术制备纳米结构的相关效果。

我们研究了在透射电子显微镜系统中使用液相电子束诱导沉积技术制造的硅，碳和SiC x纳米结构。从固定电子束辐照获得的纳米点遵循普遍尺寸与电子束剂量的趋势，CH2Cl2中前体的浓度从纯SiCl4到0％SiCl4，电子束强度范围为两个数量级，显示了良好的沉积可控性。二次电子有助于确定纳米结构的横向尺寸，而一次电子束似乎具有降低垂直生长速率的作用。这些结果可用于产生甜甜圈状的纳米结构。使用扫描电子束，还获得了具有分支和非分支形态的线结构。