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Ultra-high energy density thin-film capacitors with high power density using BaSn0.15Ti0.85O3/Ba0.6Sr0.4TiO3 heterostructure thin films
Journal of Power Sources ( IF 9.2 ) Pub Date : 2018-12-10 , DOI: 10.1016/j.jpowsour.2018.12.012
Shihui Yu , Chunmei Zhang , Muying Wu , Helei Dong , Lingxia Li

Ultra-high energy storage performance of lead-free ferroelectric materials has been achieved at room temperature by heterostructure composite based on environment-friendly BaSn0.15Ti0.85O3 and Ba0.6Sr0.4TiO3 thin films. The dielectric constant and loss tangent of BaSn0.15Ti0.85O3 layers grown on the Ba0.6Sr0.4TiO3 layers respectively are calculated as 402 and 0.0137 at 100 kHz. The interfacial layer between BaSn0.15Ti0.85O3 and Ba0.6Sr0.4TiO3 layers can improve the dielectric constant and reduce the loss tangent of heterostructures. The electrical breakdown strength can be significantly enhanced by the interfacial layer, and the influence mechanism is proposed. Ultra-high energy storage density as high as 43.28 J/cm3, is obtained at a sustained high bias electric field of 2.37 MV/cm with a power density of 6.47 MW/cm3 and an efficiency of 84.91% in the BaSn0.15Ti0.85O3/Ba0.6Sr0.4TiO3 heterostructure thin films.



中文翻译:

使用BaSn 0.15 Ti 0.85 O 3 / Ba 0.6 Sr 0.4 TiO 3异质结构薄膜的高功率密度超高能量密度薄膜电容器

通过基于环保的BaSn 0.15 Ti 0.85 O 3和Ba 0.6 Sr 0.4 TiO 3薄膜的异质结构复合材料,在室温下实现了无铅铁电材料的超高储能性能。在100 kHz下,分别在Ba 0.6 Sr 0.4 TiO 3层上生长的BaSn 0.15 Ti 0.85 O 3层的介电常数和损耗角正切计算为402和0.0137。BaSn 0.15 Ti 0.85 O 3和Ba 0.6之间的界面层Sr 0.4 TiO 3层可以提高介电常数,减少异质结构的损耗角正切。通过界面层可以显着提高电击穿强度,并提出了影响机理。在2.37 MV / cm的持续高偏置电场下获得了高达43.28 J / cm 3的超高储能密度,在BaSn 0.15 Ti中的功率密度为6.47 MW / cm 3,效率为84.91%。0.85 O 3 / Ba 0.6 Sr 0.4 TiO 3异质结构薄膜。

更新日期:2018-12-10
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