Hybrid Microwave Annealing for Fabrication of More Efficient Semiconductor Photoanodes for Solar Water Splitting,ACS Sustainable Chemistry & Engineering

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Hybrid Microwave Annealing for Fabrication of More Efficient Semiconductor Photoanodes for Solar Water Splitting
ACS Sustainable Chemistry & Engineering ( IF 7.1 ) Pub Date : 2018-11-27 00:00:00 , DOI: 10.1021/acssuschemeng.8b04562
Ju Hun Kim ₁ , Youn Jeong Jang ₁ , Sun Hee Choi ₂ , Byeong Jun Lee ₁ , Min Hee Lee ₁ , Jae Sung Lee ₁

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Hybrid microwave annealing (HMA) is proposed as an alternative to conventional thermal annealing (CTA) in a furnace to fabricate efficient semiconductor photoelectrodes for solar water splitting. Thus, the effects of HMA are investigated in comparison with CTA using spinel zinc ferrite as an example. The ZnFe₂O₄ photoanodes fabricated by HMA with a graphite susceptor provide less defective surface, better structural ordering and smaller feature size than photoanodes prepared by CTA. Besides, HMA does not impair conductivity of the F:SnO₂ glass substrate. All these positive factors of HMA leads to ∼4 times higher photocurrents at 1.23 V_RHE and lowered onset potential by ∼100 mV under 1 sun irradiation of an optimized ZnFe₂O₄ photoanode relative to that fabricated by CTA. The HMA could be an effective generic method to fabricate efficient photoelectrodes based on refractory semiconductors replacing incumbent CTA.

中文翻译：

混合微波退火技术用于制造更高效的太阳能光分解用半导体光阳极

提出了混合微波退火（HMA）作为炉中常规热退火（CTA）的替代方法，以制造用于太阳能水分解的有效半导体光电极。因此，以尖晶石型锌铁氧体为例，与CTA相比，研究了HMA的效果。HMA用石墨基座制造的ZnFe ₂ O ₄光电阳极比CTA制备的光电阳极具有更少的缺陷表面，更好的结构有序性和更小的特征尺寸。此外，HMA不会损害F：SnO ₂玻璃基板的导电性。在优化的ZnFe的1次太阳照射下，HMA的所有这些积极因素导致在1.23 V _RHE处产生约4倍的高光电流，并且将起始电位降低了约100 mV。相对于CTA制备的₂ O ₄光电阳极。HMA可能是一种有效的通用方法，可基于难熔的半导体代替现有的CTA来制造高效的光电电极。

更新日期：2018-11-27

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