High reactivity and sintering resistance are key factors to design outstanding CH₄ oxidation noble metal-based supported catalysts. Herein, we prepared and screened 0.5 wt% Pd/Al₂O₃ (among 0.3–3 wt% Pd loading) samples prepared by wet impregnation with very high CH₄ catalytic activity. The hydrophobic modification of γ-Al₂O₃ support by triethoxyoctylsilane (TEOOS) exhibits further enhanced activity for CH₄ oxidation, ca. T₉₀ decrease from 375 °C to 350 °C with enhanced concentration of surface Pd⁰ sites. Besides, after Al₂O₃ protection layer deposition over the 0.5 wt% Pd/Al₂O₃ by atomic layer deposition (ALD), distinct higher temperature stability due to reduced agglomeration was demonstrated.

高反应性和抗烧结性是设计出色的CH ₄氧化贵金属基负载型催化剂的关键因素。在这里，我们准备并筛选了通过湿法浸渍制备的具有非常高的CH ₄催化活性的0.5 wt％Pd / Al ₂ O ₃（在0.3–3 wt％Pd负载量中）样品。的疏水改性的γ-Al ₂ ö ₃支持由三乙氧基辛基硅烷（TEOOS）表现出进一步增强的活性为CH ₄氧化，约 随着表面Pd ⁰位点浓度的增加，T ₉₀从375°C降至350°C 。此外，在Al ₂ O _3之后通过原子层沉积（ALD）在0.5 wt％Pd / Al ₂ O _3上沉积保护层，显示出由于减少的团聚而明显的更高的温度稳定性。