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Assessment of full-scale tertiary wastewater treatment by UV-C based-AOPs: Removal or persistence of antibiotics and antibiotic resistance genes?
Science of the Total Environment ( IF 8.2 ) Pub Date : 2018-10-17 , DOI: 10.1016/j.scitotenv.2018.10.223
Jorge Rodríguez-Chueca , Saulo Varella della Giustina , Jaqueline Rocha , Telma Fernandes , Cristina Pablos , Ángel Encinas , Damià Barceló , Sara Rodríguez-Mozaz , Célia M. Manaia , Javier Marugán

This research reports for the first time the full-scale application of different homogeneous Advanced Oxidation Processes (AOPs) (H2O2/UV-C, PMS/UV-C and PMS/Fe(II)/UV-C) for the removal of antibiotics (ABs) and antibiotic resistance genes (ARGs) from wastewater effluent at Estiviel wastewater treatment plant (WWTP) (Toledo, Spain).

AOPs based on the photolytic decomposition of H2O2 and peroxymonosulfate tested at low dosages (0.05–0.5 mM) and with very low UV-C contact time (4–18 s) demonstrated to be more efficient than UV-C radiation alone on the removal of the analyzed ABs. PMS (0.5 mM) combined with UV-C (7 s contact time) was the most efficient treatment in terms of AB removal: 7 out of 10 ABs detected in the wastewater were removed more efficiently than using the other oxidants. In terms of ARGs removal efficiency, UV-C alone seemed the most efficient treatment, although H2O2/UV-C, PMS/UV-C and PMS/Fe(II)/UV-C were supposed to generate higher concentrations of free radicals. The results show that treatments with the highest removal of ABs and ARGs did not coincide, which could be attributed to the competition between DNA and oxidants in the absorption of UV photons, reducing the direct photolysis of the DNA. Whereas the photolytic ABs removal is improved by the generation of hydroxyl and sulfate radicals, the opposite behavior occurs in the case of ARGs. These results suggest that a compromise between ABs and ARGs removal must be achieved in order to optimize wastewater treatment processes.



中文翻译:

评估基于UV-C的AOP进行的大规模第三级废水处理:抗生素和抗生素抗性基因的去除或持久性?

这项研究首次报告了不同均质高级氧化工艺(AOP)(H 2 O 2 / UV-C,PMS / UV-C和PMS / Fe(II)/ UV-C)的全面应用。从Estiviel废水处理厂(WWTP)(西班牙托莱多)的废水中去除抗生素(ABs)和抗生素抗性基因(ARG)。

在低剂量(0.05–0.5 mM)和极低的UV-C接触时间(4–18 s)下测试的基于H 2 O 2和过氧一硫酸盐的光解分解的AOP被证明比单独使用UV-C辐射更有效去除分析的AB。就去除AB而言,PMS(0.5 mM)与UV-C(7 s接触时间)相结合是最有效的处理方法:与其他氧化剂相比,废水中检测到的10种AB中的7种被更有效地去除。就ARGs去除效率而言,尽管H 2 O 2单独使用UV-C似乎是最有效的处理方法。/ UV-C,PMS / UV-C和PMS / Fe(II)/ UV-C被认为会产生更高浓度的自由基。结果表明,ABs和ARGs去除率最高的处理方式并不吻合,这可能归因于DNA和氧化剂在吸收紫外线光子方面的竞争,从而减少了DNA的直接光解。尽管通过羟基和硫酸根自由基的产生可以改善光解性ABs的去除,但在ARGs中却发生相反的行为。这些结果表明,必须优化AB和ARG的去除之间的折衷,以优化废水处理过程。

更新日期:2018-10-31
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