Structural Optimization of Oxide/Metal/Oxide Transparent Conductors for High‐Performance Low‐Emissivity Heaters,Advanced Materials Interfaces

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Structural Optimization of Oxide/Metal/Oxide Transparent Conductors for High‐Performance Low‐Emissivity Heaters
Advanced Materials Interfaces ( IF 4.3 ) Pub Date : 2018-10-15 , DOI: 10.1002/admi.201801287
Peng Li ₁ , Huapeng Li ₁ , Jiangang Ma ₁ , Yu Zhou ₂ , Wei Zhang ₁ , Lujia Cong ₁ , Haiyang Xu ₁ , Yichun Liu ₁

Affiliation

Oxide/metal/oxide transparent conductors (TCs) have attracted increasing interest in response to demands of explosively developing flexible optoelectronic devices. Fabricating continuous ultrathin metal films on supporting oxides is an unsolved conundrum due to Volmer–Weber growth. Instead of introducing a nucleation inducer, which generally results in inferior optical‐electrical performances, an oxygen plasma treatment‐assisted method is used to prepare Al‐doped ZnO/Ag/Al‐doped ZnO (AZO/Ag/AZO) TCs. Experimental results evidence that increasing surface energy and adhesion of the supporting AZO film allows the formation of a continuous Ag film as thin as 6 nm. The oxygen plasma treatment successfully suppresses the Volmer–Weber and improves the visible transmission, infrared reflectance, and conductivity of the AZO/Ag/AZO TCs. Furthermore, thicknesses of the AZO films in AZO/Ag/AZO TCs are elaborately optimized by using finite‐difference time‐domain method to balance the transmittance and reflectance. The resulting AZO/Ag/AZO TCs are incorporated in low‐emissivity heaters that exhibit high visible transmittance (93.6%@550 nm), high infrared reflectance (67%@1500 nm), low sheet resistance (5.6 Ω □⁻¹), and low operating voltage (5 V). These results offer valuable insight into the role of oxygen plasma treatment in altering the metal growth mode on oxide surfaces, these structural optimization methods can be extended to the development of oxide/metal/oxide‐based electronics.

中文翻译：

高性能低辐射率加热器的氧化物/金属/氧化物透明导体的结构优化

响应于爆炸性地开发柔性光电器件的需求，氧化物/金属/氧化物透明导体（TC）引起了越来越多的兴趣。由于Volmer–Weber的生长，在支撑氧化物上制备连续的超薄金属膜是一个尚未解决的难题。代替引入通常会导致较差的光电性能的成核诱导剂，氧等离子体处理辅助方法用于制备Al掺杂的ZnO / Ag / Al掺杂的ZnO（AZO / Ag / AZO）TC。实验结果证明，增加表面能和支持性AZO膜的附着力可以形成连续薄至6 nm的Ag膜。氧等离子体处理成功地抑制了Volmer–Weber，并改善了AZO / Ag / AZO TC的可见光透射率，红外反射率和电导率。此外，通过使用有限差分时域方法来平衡透射率和反射率，对AZO / Ag / AZO TC中AZO膜的厚度进行了优化。所得的AZO / Ag / AZO TC被并入低辐射率加热器中，该加热器表现出高可见光透射率（93.6%@550 nm），高红外反射率（67％@ 1500 nm），低薄层电阻（5.6Ω□^-1）和低工作电压（5 V）。这些结果为了解氧等离子体处理在改变氧化物表面上的金属生长方式方面的作用提供了宝贵的见识，这些结构优化方法可以扩展到基于氧化物/金属/氧化物的电子学的发展。

更新日期：2018-10-15

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