Diboron‐Assisted Interfacial Defect Control Strategy for Highly Efficient Planar Perovskite Solar Cells,Advanced Materials

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Diboron‐Assisted Interfacial Defect Control Strategy for Highly Efficient Planar Perovskite Solar Cells
Advanced Materials ( IF 27.4 ) Pub Date : 2018-10-08 , DOI: 10.1002/adma.201805085
Yongguang Tu ₁ , Xiaoyu Yang ₁ , Rui Su ₁ , Deying Luo _{1,

2} , Yang Cao ₃ , Lichen Zhao ₁ , Tanghao Liu ₁ , Wenqiang Yang ₁ , Yifei Zhang ₁ , Zhaojian Xu ₁ , Quanzhen Liu ₄ , Jihuai Wu ₄ , Qihuang Gong _{1,

2,

5} , Fanyang Mo ₃ , Rui Zhu _{1,

2,

5}

Affiliation

Metal halide perovskite films are endowed with the nature of ions and polycrystallinity. Formamidinium iodide (FAI)‐based perovskite films, which include large cations (FA) incorporated into the crystal lattice, are most likely to induce local defects due to the presence of the unreacted FAI species. Here, a diboron‐assisted strategy is demonstrated to control the defects induced by the unreacted FAI both inside the grain boundaries and at the surface regions. The diboron compound (C₁₂H₁₀B₂O₄) can selectively react with unreacted FAI, leading to reduced defect densities. Nonradiative recombination between a perovskite film and a hole‐extraction layer is mitigated considerably after the introduction of the proposed approach and charge‐carrier extraction is improved as well. A champion power conversion efficiency of 21.11% is therefore obtained with a stabilized power output of 20.83% at the maximum power point for planar perovskite solar cells. The optimized device also delivers negligible hysteresis effect under various scanning conditions. This approach paves a new way for mitigating defects and improving device performance.

中文翻译：

高效平面钙钛矿太阳能电池的Diboron辅助界面缺陷控制策略

金属卤化物钙钛矿薄膜具有离子的性质和多晶性。基于碘化甲酰胺（FAI）的钙钛矿薄膜，其中包括掺入晶格中的大阳离子（FA），由于存在未反应的FAI物种而最有可能引起局部缺陷。在这里，演示了一种用硼辅助的策略来控制由未反应的FAI引起的缺陷，该缺陷既在晶界内部也发生在表面区域。二硼化合物（C ₁₂ H ₁₀ B ₂ O ₄）可以与未反应的FAI选择性反应，从而降低缺陷密度。引入提出的方法后，钙钛矿膜和空穴提取层之间的非辐射复合得到了很大的缓解，并且电荷载流子的提取也得到了改善。因此，在平面钙钛矿太阳能电池的最大功率点处获得了21.11％的最佳功率转换效率，而稳定的功率输出为20.83％。经过优化的设备在各种扫描条件下的滞后效应也可以忽略不计。这种方法为减轻缺陷和提高设备性能开辟了一条新途径。

更新日期：2018-10-08

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