Atomic Layer Deposition for Membranes: Basics, Challenges, and Opportunities,Chemistry of Materials

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Atomic Layer Deposition for Membranes: Basics, Challenges, and Opportunities
Chemistry of Materials ( IF 7.2 ) Pub Date : 2018-10-03 00:00:00 , DOI: 10.1021/acs.chemmater.8b02687
Matthieu Weber ₁ , Anne Julbe ₁ , André Ayral ₁ , Philippe Miele _{1,

2} , Mikhael Bechelany ₁

Affiliation

Atomic layer deposition (ALD) is a technology offering the possibility to prepare thin films of high quality materials on high aspect ratio substrates with precise thickness control, high uniformity and excellent conformality, a unique capability. Therefore, this route is particularly suited for the structural modification and pore tailoring of synthetic membranes. ALD coatings have been prepared on a wide variety of membrane substrates, from inorganic templated supports to porous polymers. This minireview aims to provide an extensive summary of the advances of ALD applied to membranes. A selected list of studies will be used to illustrate how the ALD route can be implemented to improve the operational performance of different inorganic, organic, hybrid or composite membranes. Furthermore, the challenges and opportunities of the route for this specific membrane application are also discussed. This work comprehensively shows the benefits of ALD and its application in various facets of membranes and membrane associated engineering processes, and will help exploiting the numerous prospects of this emerging and growing field.

中文翻译：

膜的原子层沉积：基础知识，挑战和机遇

原子层沉积（ALD）技术提供了在高长宽比的基板上制备高质量材料薄膜的可能性，该薄膜具有精确的厚度控制，高的均匀性和出色的保形性以及独特的功能。因此，该途径特别适合于合成膜的结构改性和孔定制。从无机模板载体到多孔聚合物，ALD涂层已在多种膜基材上制备。这份小型综述旨在提供ALD应用于膜的研究进展的广泛摘要。将使用选定的研究列表来说明如何实施ALD路线，以改善不同无机，有机，杂化或复合膜的运行性能。此外，还讨论了该特定膜应用路线的挑战和机遇。这项工作全面地展示了ALD及其在膜的各个方面以及与膜相关的工程流程中的应用所带来的好处，并且将有助于开发该新兴领域和不断发展的领域的众多前景。

更新日期：2018-10-03

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