Low-Dose Aberration-Free Imaging of Li-Rich Cathode Materials at Various States of Charge Using Electron Ptychography,Nano Letters

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Low-Dose Aberration-Free Imaging of Li-Rich Cathode Materials at Various States of Charge Using Electron Ptychography
Nano Letters ( IF 9.6 ) Pub Date : 2018-09-26 00:00:00 , DOI: 10.1021/acs.nanolett.8b02718
Juan G. Lozano ₁ , Gerardo T. Martinez ₁ , Liyu Jin ₁ , Peter D. Nellist ₁ , Peter G. Bruce ₁

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Imaging the complete atomic structure of materials, including light elements, with minimal beam-induced damage of the sample is a long-standing challenge in electron microscopy. Annular bright-field scanning transmission electron microscopy is often used to image elements with low atomic numbers, but due to its low efficiency and high sensitivity to precise imaging parameters it comes at the price of potentially significant beam damage. In this paper, we show that electron ptychography is a powerful technique to retrieve reconstructed phase images that provide the full structure of beam-sensitive materials containing light and heavy elements. Due to its much higher efficiency, we can reduce the beam currents used down to the subpicoampere range. Electron ptychography also allows residual lens aberrations to be corrected at the postprocessing stage, which avoids the need for fine-tuning of the probe that would result in further beam damage and provides aberration-free reconstructed phase images. We have used electron ptychography to obtain structural information from aberration-free reconstructed phase images in the technologically relevant lithium-rich transition metal oxides at different states of charge. We can unambiguously determine the position of the lithium and oxygen atomic columns while amorphization of the surface, formation of beam-induced surface reconstruction layers, or migration of transition metals to the alkali layers are drastically reduced.

中文翻译：

富锂阴极材料在不同电荷状态下的低剂量无像差成像，采用电子刻蚀技术

在电子显微镜中，对包括光元素在内的材料的完整原子结构进行成像，以最小的束引起的样品损伤是一项长期的挑战。环形明场扫描透射电子显微镜通常用于成像低原子序数的元素，但是由于其低效率和对精确成像参数的高灵敏度，其代价是可能会受到严重的光束损坏。在本文中，我们表明电子谱图技术是一种强大的技术，可检索重建的相图，该相图可提供包含轻元素和重元素的电子束敏感材料的完整结构。由于其更高的效率，我们可以将使用的电子束电流降低至亚皮安级范围。电子刻印术还可以在后处理阶段校正残留的镜片像差，这样就避免了对探头进行微调的需要，因为微调会导致进一步的光束损伤，并提供了无像差的重建相位图像。我们已使用电子分型术从技术上相关的富含锂的过渡金属氧化物中的不同电荷状态下的无像差重建相图像中获取结构信息。我们可以明确地确定锂原子和氧原子列的位置，同时大大减少表面的非晶化，束流诱导的表面重建层的形成或过渡金属向碱层的迁移。我们已使用电子分型术从技术上相关的富含锂的过渡金属氧化物中的不同电荷状态下的无像差重建相图像中获取结构信息。我们可以明确地确定锂原子和氧原子列的位置，同时大大减少表面的非晶化，束流诱导的表面重建层的形成或过渡金属向碱层的迁移。我们已使用电子分型术从技术上相关的富含锂的过渡金属氧化物中的不同电荷状态下的无像差重建相图像中获取结构信息。我们可以明确地确定锂原子和氧原子列的位置，同时大大减少表面的非晶化，束流诱导的表面重建层的形成或过渡金属向碱层的迁移。

更新日期：2018-09-26

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