Abstract This article presents a comprehensive review about the current research activities on colloidal lithography, a highly efficient technology for fabricating large-area patterned functional nanostructures. Three aspects are elaborated: i) self-assembly of monolayer of colloidal crystals (MCCs) and their modifications; ii) lithographic patterning methods, including deposition and patterning of functional materials and pattern transfer onto the underlying substrates; iii) promising applications, especially in the optical and photonic-related fields in the past several years. Finally, perspectives on the current challenges and future trends in this area are given. The present review intends to inspire more ingenious designs and exciting research in colloidal lithography for advanced nanofabrication.

中文翻译：

---

高级胶体光刻：从图案化到应用

摘要 本文全面回顾了胶体光刻的当前研究活动，胶体光刻是一种制造大面积图案化功能纳米结构的高效技术。详细阐述了三个方面：i）胶体晶体（MCC）单层的自组装及其修饰；ii) 光刻图案化方法，包括功能材料的沉积和图案化以及图案转移到底层基板上；iii) 有前景的应用，特别是在过去几年中在光学和光子相关领域。最后，给出了对该领域当前挑战和未来趋势的看法。本综述旨在激发在用于高级纳米制造的胶体光刻方面进行更巧妙的设计和令人兴奋的研究。