Toward Mass Production of CVD Graphene Films,Advanced Materials

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Toward Mass Production of CVD Graphene Films
Advanced Materials ( IF 27.4 ) Pub Date : 2018-09-16 , DOI: 10.1002/adma.201800996
Bing Deng ₁ , Zhongfan Liu _{1,

2} , Hailin Peng _{1,

2}

Affiliation

Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large‐area and high‐quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain sizes, uniform layers, fast growth, and low synthesis temperatures. Some attempts have been made by both the scientific community and startup companies to mass produce graphene films; however, there is a large difference in the quality of graphene synthesized on a laboratory scale and an industrial scale. Here, recent progress toward the mass production of CVD graphene films is summarized, including the manufacturing process, equipment, and critical process parameters. Moreover, the large‐scale homogeneity of graphene films and fast characterization methods are also discussed, which are crucial for quality control in mass production.

中文翻译：

致力于大规模生产CVD石墨烯薄膜

化学气相沉积（CVD）由于具有出色的可控制性和可扩展性，因此被认为是制造大面积高质量石墨烯薄膜的有效方法。为了控制石墨烯的生长，已经做出了巨大的努力，以实现较大的畴尺寸，均匀的层，快速的生长和较低的合成温度。科学界和初创公司都做出了一些尝试来大量生产石墨烯薄膜。然而，在实验室规模和工业规模上合成的石墨烯的质量存在很大差异。在此，总结了大规模生产CVD石墨烯薄膜的最新进展，包括制造工艺，设备和关键工艺参数。此外，还讨论了石墨烯薄膜的大规模均匀性和快速表征方法，

更新日期：2018-09-16

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