Abstract Stress measurement is an important field of non-destructive testing and evaluation (NDT&E). This can ensure stability and structural rigidity of workpieces. The challenging task of stress measurement is the properties characterization of the microscopic magnetic, especially the microstructure at different location of grains. The qualitative analysis of magnetic properties variation under low stress inside grain and around grain boundary are difficult to be obtained with a reliable solution. This paper investigates characters of the domain wall inside grains and around grain boundaries under low tensile stress. The domain walls of the silicon steel sheet are captured by the magneto-optical Kerr effect (MOKE) microscopy. The stress changes the magneto-elastic energy and the angle between magnetization and stress. The relationship among domain wall, magneto-elastic energy, the magnetization inside grains and around grains boundaries under different tensile stress is provided and analyzed in details. Magnetization work calculates the energy required for magnetization to quantify the difference of the magnetic domains distribution caused by increment of magneto-elastic energy under different tensile stress in different locations. The difference of magnetization work in these locations is highly affected by the tensile stress. This proposed work has the potential to evaluate the effect of grain and grain boundary on stress measurement.

中文翻译：

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拉伸应力下晶粒内部和晶界周围的畴壁特征

摘要 应力测量是无损检测与评估（NDT&E）的一个重要领域。这样可以保证工件的稳定性和结构刚性。应力测量的挑战性任务是微观磁性的特性表征，尤其是晶粒不同位置的微观结构。晶粒内部和晶界周围低应力下磁性能变化的定性分析很难获得可靠的解决方案。本文研究了低拉应力下晶粒内部和晶界周围畴壁的特征。硅钢片的畴壁由磁光克尔效应 (MOKE) 显微镜捕获。应力会改变磁弹性能以及磁化强度与应力之间的角度。详细分析了不同拉应力下畴壁、磁弹性能、晶粒内部和晶界周围磁化强度之间的关系。磁化功计算磁化所需的能量，以量化不同位置在不同张应力下磁弹性能量增加引起的磁畴分布差异。这些位置的磁化功差异受张应力的影响很大。这项提议的工作有可能评估晶粒和晶界对应力测量的影响。磁化功计算磁化所需的能量，以量化不同位置在不同张应力下磁弹性能量增加引起的磁畴分布差异。这些位置的磁化功差异受张应力的影响很大。这项提议的工作有可能评估晶粒和晶界对应力测量的影响。磁化功计算磁化所需的能量，以量化不同位置在不同张应力下磁弹性能量增加引起的磁畴分布差异。这些位置的磁化功差异受张应力的影响很大。这项提议的工作有可能评估晶粒和晶界对应力测量的影响。