Abstract The formation and reactivity of carbon on the supported nickel catalyst is a key issue for the low temperature activity and stability with methanation, reforming and other reactions. In this work, Ni(1 1 1)/TiO2 was prepared and applied as the catalyst to deposit carbon using low temperature chemical vapor deposition (CVD) of carbon monoxide. It was found that the CVD temperature could significantly affect the formation of carbon. With the CVD temperature decreasing, the disorder of the carbon increased, while the degree of graphitization was reduced. As a result, graphene-like films can be obtained at low CVD temperatures (from 300 to 350 °C). Such carbon films show a significantly improved reactivity with hydrogen and carbon dioxide. This explains the excellent low temperature activity and stability for CO2 or CO methanation over Ni catalysts with Ni(1 1 1).

中文翻译：

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由 CO CVD 形成的碳在 Ni(111)/TiO2 上的反应性

摘要 负载型镍催化剂上碳的形成和反应是甲烷化、重整等反应低温活性和稳定性的关键问题。在这项工作中，Ni(1 1 1)/TiO2 被制备并用作催化剂，使用一氧化碳的低温化学气相沉积 (CVD) 来沉积碳。发现CVD温度可以显着影响碳的形成。随着CVD温度的降低，碳的无序度增加，石墨化程度降低。因此，可以在低 CVD 温度（300 至 350 °C）下获得类石墨烯薄膜。这种碳膜显示出显着改善的与氢气和二氧化碳的反应性。