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Substrate Patterning Using Regular Macroporous Block Copolymer Monoliths as Sacrificial Templates and as Capillary Microstamps
Small ( IF 13.0 ) Pub Date : 2018-07-19 , DOI: 10.1002/smll.201801452 Leiming Guo 1 , Michael Philippi 1 , Martin Steinhart 1
Small ( IF 13.0 ) Pub Date : 2018-07-19 , DOI: 10.1002/smll.201801452 Leiming Guo 1 , Michael Philippi 1 , Martin Steinhart 1
Affiliation
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Polystyrene‐block‐poly(2‐vinylpyridine) (PS‐b‐P2VP) monoliths containing regular arrays of macropores (diameter ≈1.1 µm, depth ≈0.7 µm) at their surfaces are used to pattern substrates by patterning modes going beyond the functionality of classical solid elastomer stamps. In a first exemplary application, the macroporous PS‐b‐P2VP monoliths are employed as sacrificial templates for the deposition of NaCl nanocrystals and topographically patterned iridium films. One NaCl nanocrystal per macropore is formed by evaporation of NaCl solutions filling the macropores followed by iridium coating. Thermal PS‐b‐P2VP decomposition yields topographically patterned iridium films consisting of ordered arrays of hexagonal cells, each of which contains one NaCl nanocrystal. For the second exemplary application, spongy‐continuous mesopore systems are generated in the macroporous PS‐b‐P2VP monoliths by selective‐swelling induced pore generation. Infiltrating the spongy‐continuous mesopore systems with ink allows capillary microstamping of continuous ink films with holes at the positions of the macropores onto glass slides compatible with advanced light microscopy. Capillary microstamping can be performed multiple times under ambient conditions without reinking and without quality deterioration of the stamped patterns. The macroporous PS‐b‐P2VP monoliths are prepared by double replication of primary macroporous silicon molds via secondary polydimethylsiloxane molds.
中文翻译：
使用常规大孔嵌段共聚物整料作为牺牲模板和毛细管微印章进行基材构图
聚苯乙烯嵌段聚（2-乙烯基吡啶）（PS- b - P2VP）整料在其表面上包含规则的大孔阵列（直径≈1.1μm，深度≈0.7μm），用于通过超出其功能范围的构图模式对基材进行构图经典的固体弹性体邮票。在第一个示例性应用中，大孔PS‐ b ‐ P2VP整料被用作牺牲模板，用于沉积NaCl纳米晶体和形貌图案化的铱膜。通过蒸发填充大孔的NaCl溶液，然后进行铱涂层，形成每个大孔一个NaCl纳米晶体。散热PS‐ b‐P2VP分解会产生具有地形图案的铱膜，该膜由六方晶格的有序阵列组成，每个六方晶格包含一个NaCl纳米晶体。对于第二个示例性应用，通过选择性溶胀诱导的孔生成，在大孔PS‐ b ‐P2VP整料中生成了海绵连续中孔系统。用墨水渗透海绵连续中孔系统，可以将连续墨水膜在大孔位置的孔上毛细管微压印到与先进的光学显微镜兼容的载玻片上。毛细管微压印可以在环境条件下进行多次，而无需重新涂墨，并且不会降低压印图案的质量。大孔PS‐ b‐P2VP整体材料是通过次级聚二甲基硅氧烷模具对主要的大孔硅模具进行双重复制而制备的。
更新日期：2018-07-19
中文翻译：
使用常规大孔嵌段共聚物整料作为牺牲模板和毛细管微印章进行基材构图
聚苯乙烯嵌段聚（2-乙烯基吡啶）（PS- b - P2VP）整料在其表面上包含规则的大孔阵列（直径≈1.1μm，深度≈0.7μm），用于通过超出其功能范围的构图模式对基材进行构图经典的固体弹性体邮票。在第一个示例性应用中，大孔PS‐ b ‐ P2VP整料被用作牺牲模板，用于沉积NaCl纳米晶体和形貌图案化的铱膜。通过蒸发填充大孔的NaCl溶液，然后进行铱涂层，形成每个大孔一个NaCl纳米晶体。散热PS‐ b‐P2VP分解会产生具有地形图案的铱膜，该膜由六方晶格的有序阵列组成，每个六方晶格包含一个NaCl纳米晶体。对于第二个示例性应用，通过选择性溶胀诱导的孔生成，在大孔PS‐ b ‐P2VP整料中生成了海绵连续中孔系统。用墨水渗透海绵连续中孔系统，可以将连续墨水膜在大孔位置的孔上毛细管微压印到与先进的光学显微镜兼容的载玻片上。毛细管微压印可以在环境条件下进行多次，而无需重新涂墨，并且不会降低压印图案的质量。大孔PS‐ b‐P2VP整体材料是通过次级聚二甲基硅氧烷模具对主要的大孔硅模具进行双重复制而制备的。
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