Atomic layer deposition (ALD) has found versatile applications in energy, environmental, and anthropogenic systems. The self‐terminating surface chemistry characteristic of ALD allows for atomic‐level control over film thickness and has unlocked attractive avenues for the development of novel nanostructured systems. Substantial modifications of standard ALD processes are achieved with the advent of powder coating technology using ALD. The basic principle of ALD is demonstrated along with a focus on the significant parameters governing the process in order to achieve good surface characteristics. The aim of this review is to explore the challenges faced in the development of reactors for powder coatings and solve the problems associated with particle distribution in the reactors. A theoretical briefing on the agglomeration phenomena in particles is provided for a better understanding of the typical particle sizes and their distributions in reactor systems. The gradual improvement in reactor designs, with particular emphasis on the homogeneous distribution of particles, is also discussed. Conclusively, the authors also review the emerging applications where this technology is being explored to overcome surface defects through the control of atomic growth on particles.

中文翻译：

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原子层沉积在粉末涂料技术中的进展

原子层沉积（ALD）已在能源，环境和人为系统中得到了广泛的应用。ALD的自终止表面化学特性允许对薄膜厚度进行原子级控制，并为新型纳米结构系统的开发开辟了诱人的途径。随着使用ALD的粉末涂料技术的问世，对标准ALD工艺进行了重大修改。演示了ALD的基本原理，并重点介绍了控制过程的重要参数以实现良好的表面特性。这篇综述的目的是探讨粉末涂料反应堆在开发中所面临的挑战，并解决与反应堆中颗粒分布有关的问题。提供了有关颗粒中附聚现象的理论简介，以更好地了解典型颗粒尺寸及其在反应器系统中的分布。还讨论了反应器设计的逐步改进，特别强调了颗粒的均匀分布。最后，作者还回顾了正在探索的新兴应用，其中正在探索该技术以通过控制粒子上的原子生长来克服表面缺陷。