A series of molybdenum nitride films, viz., Mo₃N₂, Ag-Mo₃N₂, V-Mo₃N₂ and Cu-Mo₃N₂ have been fabricated by magnetron co-sputtering technique and evaluated as HER electrocatalysts in near-neutral pH (pH 5) buffer medium. An optimal HER activity has been observed at about 1.8 M phosphate buffer with Cu-Mo₃N₂ showing highest activity. Under strongly buffered and oxygen saturated conditions the molybdenum nitride films have consistently shown very high HER selectivity in the presence of oxygen. The stability of the molybdenum nitride films has been enhanced retaining almost 100% of the initial activity in a durability test, whereas, a significant loss in the stability has been observed for the same catalysts in 0.5 M H₂SO₄ solution.

通过磁控共溅射技术制备了一系列的氮化钼膜，即Mo ₃ N ₂，Ag-Mo ₃ N ₂，V-Mo ₃ N ₂和Cu-Mo ₃ N _2，并在HER2中用作HER电催化剂。接近中性的pH（pH 5）缓冲液。在含Cu-Mo ₃ N _2的约1.8 M磷酸盐缓冲液中观察到最佳HER活性显示最高的活动。在强缓冲和氧饱和条件下，氮化钼膜在氧存在下始终显示出很高的HER选择性。在耐久性试验中，氮化钼膜的稳定性得到了增强，保留了几乎100％的初始活性，而对于相同的催化剂，在0.5 M H ₂ SO ₄溶液中观察到稳定性的重大损失。