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ToF-SIMS study of oxide films thermally grown on nickel-base alloys
Corrosion Science ( IF 7.4 ) Pub Date : 2018-08-01 , DOI: 10.1016/j.corsci.2018.06.043
Xiaocui Wu , Svetlana Voyshnis , Antoine Seyeux , Yuriy Chumlyakov , Philippe Marcus

Abstract The oxidation behaviours of polycrystalline and monocrystalline Ni-base alloys (Ni-16Cr-8Fe (wt%)) were investigated in situ by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS). The oxide layer formed is duplex: an inner chromium-rich layer and an outer layer which is rich in nickel and iron. Time evolution of the composition of inner layer from pure Cr2O3 towards spinel (NiCr2O4) was observed. The oxidation kinetics was accelerated by alloy grain boundaries, which can favour the diffusion of chromium. Both the parabolic and volatilization constants increased with increasing temperature, with kp varying from 1.9×10−3 to 1.6×10−2 nm2.s−1, and kv from 1.0×10−3 to 2.9×10−3 nm.s−1.

中文翻译:

镍基合金上热生长氧化膜的 ToF-SIMS 研究

摘要 采用飞行时间二次离子质谱法 (ToF-SIMS) 原位研究了多晶和单晶镍基合金 (Ni-16Cr-8Fe (wt%)) 的氧化行为。形成的氧化层是双重的:内层富含铬,外层富含镍和铁。观察到内层成分从纯 Cr2O3 到尖晶石 (NiCr2O4) 的时间演变。合金晶界加速了氧化动力学,这有利于铬的扩散。抛物线常数和挥发常数都随着温度的升高而增加,kp 从 1.9×10-3 变化到 1.6×10-2 nm2.s-1,kv 从 1.0×10-3 变化到 2.9×10-3 nm.s- 1.
更新日期:2018-08-01
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