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Emerging nanofabrication and quantum confinement techniques for 2D materials beyond graphene
npj 2D Materials and Applications ( IF 9.1 ) Pub Date : 2018-07-16 , DOI: 10.1038/s41699-018-0065-3
Michael G. Stanford , Philip D. Rack , Deep Jariwala

Recent advances in growth techniques have enabled the synthesis of high-quality large area films of 2D materials beyond graphene. As a result, nanofabrication methods must be developed for high-resolution and precise processing of these atomically thin materials. These developments are critical both for the integration of 2D materials in complex, integrated circuitry, as well as the creation of sub-wavelength and quantum-confined nanostructures and devices which allow the study of novel physical phenomena. In this review, we summarize recent advances in post-synthesis nanopatterning and nanofabrication techniques of 2D materials which include (1) etching techniques, (2) atomic modification, and (3) emerging nanopatterning techniques. We detail novel phenomena and devices which have been enabled by the recent advancement in nanofabrication techniques and comment on future outlook of 2D materials beyond graphene.



中文翻译:

超越石墨烯的2D材料的新兴纳米加工和量子限制技术

生长技术的最新进展使得能够合成石墨烯以外的2D材料的高质量大面积薄膜。结果,必须开发纳米制造方法以高分辨率和精确地处理这些原子薄的材料。这些发展对于将2D材料集成到复杂的集成电路中,以及创建能够研究新颖的物理现象的亚波长和量子限制的纳米结构和器件都是至关重要的。在这篇综述中,我们总结了2D材料的合成后纳米图案化和纳米加工技术的最新进展,这些技术包括(1)蚀刻技术,(2)原子修饰和(3)新兴的纳米图案化技术。

更新日期:2019-05-16
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