Dense ZnO films with a strong c‐axis texture have been deposited on transparent conductive oxide glass, glass, and Si wafers, respectively, with a two‐step pressureless wet chemical method using zinc acetate dihydrate as Zn‐precursor. The crystallographic structure of the films has been studied with XRD and scanning electron microscopy. Optical measurements reveal a high transparency of the ZnO films with a thickness of up to 10 μm. This new cost‐effective route for ZnO film deposition does not require expensive sophisticated equipment and is easily upscaled.

中文翻译：

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用于主动降噪窗口的纹理致密氧化锌层

使用二水合醋酸锌作为锌前体，采用两步无压湿化学法，将具有强 c 轴织构的致密 ZnO 薄膜分别沉积在透明导电氧化物玻璃、玻璃和 Si 晶片上。用XRD和扫描电子显微镜研究了薄膜的晶体结构。光学测量显示厚度高达 10 μm 的 ZnO 薄膜具有高透明度。这种用于 ZnO 薄膜沉积的具有成本效益的新途径不需要昂贵的精密设备，并且易于升级。