Compositionally tunable ternary Bi2(Se1−xTex)3 and (Bi1−ySby)2Te3 thin films via low pressure chemical vapour deposition†,Journal of Materials Chemistry C

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Compositionally tunable ternary Bi2(Se1−xTex)3 and (Bi1−ySby)2Te3 thin films via low pressure chemical vapour deposition†
Journal of Materials Chemistry C ( IF 5.7 ) Pub Date : 2018-07-12 00:00:00 , DOI: 10.1039/c8tc01285g
Sophie L. Benjamin _{1,

2,

3,

4,

5} , C. H. (Kees) de Groot _{2,

3,

4,

6} , Chitra Gurnani _{1,

2,

3,

4,

7} , Samantha L. Hawken _{1,

2,

3,

4} , Andrew L. Hector _{1,

2,

3,

4} , Ruomeng Huang _{2,

3,

4,

6} , Marek Jura _{4,

8,

9,

10,

11} , William Levason _{1,

2,

3,

4} , Eleanor Reid _{1,

2,

3,

4} , Gillian Reid _{1,

2,

3,

4} , Stephen P. Richards _{1,

2,

3,

4} , Gavin B. G. Stenning _{4,

8,

9,

10,

11}

Affiliation

The inherently rapid ligand substitution kinetics associated with the novel and chemically compatible precursors, [MCl₃(EⁿBu₂)₃] (M = Sb, Bi; E = Se, Te), enable CVD growth of ternary Bi₂(Se_1−xTe_x)₃ and (Bi_1−ySb_y)₂Te₃ thin films with very good compositional, structural and morphological control, for the first time. X-ray diffraction data follow Vegard's law and Raman bands shift linearly with the atom substitutions, indicating very well-distributed solid solutions.

中文翻译：

通过低压化学气相沉积法可组成可调的三元Bi ₂（Se _{1- x} Te _x）₃和（Bi _{1- y} Sb _y）₂ Te ₃薄膜†

与新型且化学相容的前体[MCl ₃（E ⁿ Bu ₂）₃ ]（M = Sb，Bi; E = Se，Te）相关的固有的快速配体取代动力学使三元Bi ₂（Se _{1 − x} Te _x）₃和（Bi _{1- y} Sb _y）₂ Te ₃薄膜首次具有非常好的成分，结构和形态控制。X射线衍射数据遵循Vegard定律，拉曼能带随原子取代而线性移动，表明固溶体分布非常均匀。

更新日期：2018-07-12

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