Influence of Plume Properties on Thin Film Composition in Pulsed Laser Deposition,Advanced Materials Interfaces

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Influence of Plume Properties on Thin Film Composition in Pulsed Laser Deposition
Advanced Materials Interfaces ( IF 4.3 ) Pub Date : 2018-07-09 , DOI: 10.1002/admi.201701062
Alejandro Ojeda-G-P ₁ , Max Döbeli ₂ , Thomas Lippert _{1,

3}

Affiliation

Despite the apparent simplicity of pulsed laser deposition, consistent deposition of thin films with the desired thickness, composition, crystallinity, and quality still remains challenging. This article explores the influence of process parameters with respect to film thickness and composition, two key aspects for thin films which have a very strong effect on film properties, possible applications, and characterization. Using five perovskite materials, a systematic analysis of different process parameters, e.g., target material, deposition pressure, fluence, substrate temperature or target to substrate distance, is performed. The results are classified under target ablation, plasma expansion, and substrates effects, which provide vital guidance to reduce the degree of trial and error when producing thin films. Moreover, they enable the understanding of what should be considered, and avoided for the deposition of thin films.

中文翻译：

脉冲激光沉积中羽流特性对薄膜成分的影响

尽管脉冲激光沉积的表面简单性，但具有所需厚度，组成，结晶度和质量的薄膜的均匀沉积仍然具有挑战性。本文探讨了工艺参数对薄膜厚度和组成的影响，这是薄膜的两个关键方面，它们对薄膜的性能，可能的应用和特性具有非常重要的影响。使用五种钙钛矿材料，对不同工艺参数（例如目标材料，沉积压力，注量，基底温度或目标到基底的距离）进行系统分析。结果归类于目标烧蚀，等离子体膨胀和基底效应，这为减少生产薄膜时的反复试验程度提供了重要指导。而且，

更新日期：2018-07-09

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