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Effect of Ar, O2, and N2 Plasma on the Growth and Composition of Vanadium Oxide Nanostructured Thin Films
Advanced Materials Interfaces ( IF 4.3 ) Pub Date : 2018-07-04 , DOI: 10.1002/admi.201800612 Megha Singh 1 , Prabhat Kumar 1 , Gade Brahmaiah Reddy 1
Advanced Materials Interfaces ( IF 4.3 ) Pub Date : 2018-07-04 , DOI: 10.1002/admi.201800612 Megha Singh 1 , Prabhat Kumar 1 , Gade Brahmaiah Reddy 1
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Vanadium oxide nanostructured thin films (NTFs) are synthesized using plasma assisted sublimation process (PASP) in different gases' Ar, O2, and N2 plasma (AP, OP, and NP) and O2 gas (OG) ambient. Morphological studies conducted via electron microscopy reveal nanostrips, nanoflakes, nanorods, and nanoparticles organized as clusters for OP, OG, AP, and NP respectively. X‐ray photoelectron spectroscopy (XPS) studies show that samples OP and OG are composed of α‐V2O5, whereas AP and NP are composed of V6O13 along with V2O5. The relative percentages calculated using XPS data show that in AP, V6O13, and V2O5 are 38 and 62%, respectively. These percentages change to 48% for V6O13 and 52% for V2O5 in NP. The V6O13/V2O5 ratio is lower in AP than NP. This increment of V6O13 in NP is due to presence of more reductive species in N2 plasma than Ar plasma. Since N2 plasma contains species like N*, 
, etc. it leads to the formation of NO2, N2O, etc. Raman spectra indicate the surface of the sample NP consisting of both V6O13 and V2O5, agreeing with the X‐ray diffraction (XRD) and XPS results. Studies demonstrate that plasma ambient during synthesis process affects both morphology and composition of deposited vanadium oxide NTFs.
中文翻译：
Ar，O2和N2等离子体对氧化钒纳米结构薄膜生长和组成的影响
使用等离子体辅助升华工艺（PASP）在不同气体的Ar，O 2和N 2等离子体（AP，OP和NP）以及O 2气体（OG）环境中合成了氧化钒纳米结构薄膜（NTF）。通过电子显微镜进行的形态学研究揭示了分别以OP，OG，AP和NP的簇形式组织的纳米带，纳米薄片，纳米棒和纳米颗粒。X射线光电子能谱（XPS）研究表明，样品OP和OG由α-V的2 ø 5，而AP和NP由第V 6 ö 13为V沿着2 ø 5。使用XPS数据计算的相对百分比表明，在AP中，V 6O 13和V 2 O 5分别为38％和62％。对于NP中的V 6 O 13，这些百分比变为48％，对于V 2 O 5，这些百分比变为52％。AP中的V 6 O 13 / V 2 O 5比低于NP。NP中V 6 O 13的增加是由于N 2等离子体中存在比Ar等离子体更多的还原性物质。由于N 2等离子体包含N *等物质，因此会导致NO 2，N 2的形成O等。拉曼光谱表明样品NP的表面由V 6 O 13和V 2 O 5组成，与X射线衍射（XRD）和XPS结果一致。研究表明，合成过程中的等离子体环境会影响沉积的钒氧化物NTF的形态和组成。
更新日期：2018-07-04
, etc. it leads to the formation of NO2, N2O, etc. Raman spectra indicate the surface of the sample NP consisting of both V6O13 and V2O5, agreeing with the X‐ray diffraction (XRD) and XPS results. Studies demonstrate that plasma ambient during synthesis process affects both morphology and composition of deposited vanadium oxide NTFs.
中文翻译：
Ar，O2和N2等离子体对氧化钒纳米结构薄膜生长和组成的影响
使用等离子体辅助升华工艺（PASP）在不同气体的Ar，O 2和N 2等离子体（AP，OP和NP）以及O 2气体（OG）环境中合成了氧化钒纳米结构薄膜（NTF）。通过电子显微镜进行的形态学研究揭示了分别以OP，OG，AP和NP的簇形式组织的纳米带，纳米薄片，纳米棒和纳米颗粒。X射线光电子能谱（XPS）研究表明，样品OP和OG由α-V的2 ø 5，而AP和NP由第V 6 ö 13为V沿着2 ø 5。使用XPS数据计算的相对百分比表明，在AP中，V 6O 13和V 2 O 5分别为38％和62％。对于NP中的V 6 O 13，这些百分比变为48％，对于V 2 O 5，这些百分比变为52％。AP中的V 6 O 13 / V 2 O 5比低于NP。NP中V 6 O 13的增加是由于N 2等离子体中存在比Ar等离子体更多的还原性物质。由于N 2等离子体包含N *
等物质，因此会导致NO 2，N 2的形成O等。拉曼光谱表明样品NP的表面由V 6 O 13和V 2 O 5组成，与X射线衍射（XRD）和XPS结果一致。研究表明，合成过程中的等离子体环境会影响沉积的钒氧化物NTF的形态和组成。
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