Abstract Isothermal oxidation of NbSi2 coating formed on Nb substrate was investigated in air at 600–900 °C, which exhibited the complex and accelerated kinetics at intermediate temperatures and failed due to either the cracking of the NbSi2 coating or the oxide layer formed. This complex oxidation behavior was governed by the balance between the stress generated by the forming of oxide phases and the subsequent stress relaxation processes. Pesting-induced accelerated oxidation at 700 °C was affected by extrinsic factors such as pre-existing defects in NbSi2 coating. Accelerated oxidation originated from the oxide layer cracking at 750 °C was intrinsic to NbSi2.

中文翻译：

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Nb 基体上生长的 NbSi 2 涂层在 600-900 °C 下的加速氧化行为

摘要 在空气中 600-900 °C 下研究了在 Nb 基体上形成的 NbSi2 涂层的等温氧化，在中间温度下表现出复杂和加速的动力学，并且由于 NbSi2 涂层开裂或形成的氧化层而失败。这种复杂的氧化行为是由形成氧化物相产生的应力与随后的应力松弛过程之间的平衡控制的。在 700 °C 下由虫蚀引起的加速氧化受到外在因素的影响，例如 NbSi2 涂层中预先存在的缺陷。源自 750 °C 氧化层开裂的加速氧化是 NbSi2 固有的。