Abstract Chemically modified graphene (CMG) bulk films have displayed a large potential in a plethora of applications. Incorporation of large CMG sheets was applied as the major strategy to improve both the electrical and mechanical properties of resulted film materials, whereas the low fabrication yield of high quality large building blocks severely obstruct its scalability. Herein, we evaluated the individual impact of sheet size and structural integrity of CMG building blocks on the performance of film materials, and results show that low structural defects density rather than large size dominates the enhancement of performance. Compared with large building blocks (average area 37.2 μm2), small ones (average area 1.3 μm2) with optimized structural integrity and also higher preparation yield formed films with even higher strength and conductivity (increased by 55% and 120%, respectively). Furthermore, the influence of structural integrity on the material performance was studied via detailed characterization. These results unequivocally impart the importance of structural integrity, and may give instruction on the rational design of materials with excellent performance.

中文翻译：

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结构完整性与横向尺寸：通过减少平面缺陷而不是薄片边界来增强石墨烯基薄膜材料

摘要 化学改性石墨烯 (CMG) 体膜在众多应用中显示出巨大的潜力。引入大型 CMG 片材被用作改善所得薄膜材料的电气和机械性能的主要策略，而高质量大型构件的低制造良率严重阻碍了其可扩展性。在此，我们评估了 CMG 积木的片材尺寸和结构完整性对薄膜材料性能的个体影响，结果表明低结构缺陷密度而不是大尺寸主导了性能的增强。与大型积木（平均面积 37.2 μm2）相比，小型积木（平均面积 1. 3 μm2) 具有优化的结构完整性和更高的制备产量，形成具有更高强度和电导率的薄膜（分别增加 55% 和 120%）。此外，通过详细的表征研究了结构完整性对材料性能的影响。这些结果明确地传达了结构完整性的重要性，并且可以指导具有优异性能的材料的合理设计。