Abstract As-deposit (AD) and field-anneal (FA) Fe 60 Co 18 Ga 22 films have been made. We found that after FA treatment, both the macro-stress and saturation magnetostriction in the film increase greatly. Also, after FA treatment, the tetragonal L1 2 phase shows up, and coexists within the original two-phase (A2 + D0 3 ) field. In agreement with the theory, the occurrence of large stress and magnetostriction is related to the magnetic-field-induced flip of the tetragonal axis of the L1 2 phase crystal by FA. As a low-field sensor, FA could enhance the sensitivity of the Fe 60 Co 18 Ga 22 film element up to 18.9 ppm/Oe.

中文翻译：

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场退火对铁磁 Fe 60 Co 18 Ga 22 /Si(100) 薄膜磁致伸缩和灵敏度的影响

摘要 已经制备了沉积 (AD) 和场退火 (FA) Fe 60 Co 18 Ga 22 薄膜。我们发现经过 FA 处理后，薄膜中的宏观应力和饱和磁致伸缩都大大增加。此外，FA处理后，四方L1 2 相出现，并在原始两相（A2 + D0 3 ）场内共存。与理论一致，大应力和磁致伸缩的发生与磁场诱导的L1 2 相晶体四方轴翻转有关。作为一种低场传感器，FA 可以将 Fe 60 Co 18 Ga 22 薄膜元件的灵敏度提高到 18.9 ppm/Oe。